Structural analysis of undoped microcrystalline silicon thin films deposited by PECVD technique

Undoped microcrystalline silicon thin films have been deposited by radio frequency powered plasma enhanced chemical vapour deposition technique. The structural order of silicon network in the films has been studied by Raman spectroscopy. The role of bonded hydrogen in the films and their consequence...

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Veröffentlicht in:	Journal of physics. D, Applied physics Applied physics, 2004-07, Vol.37 (13), p.1736-1741
Hauptverfasser:	Mukhopadhyay, Sumita, Das, Chandan, Ray, Swati
Format:	Artikel
Sprache:	eng
Schlagworte:	Condensed matter: structure, mechanical and thermal properties Exact sciences and technology Physics Structure and morphology thickness Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) Thin film structure and morphology
Online-Zugang:	Volltext
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