The effect of the substrate bias voltage and the deposition pressure on the properties of diamond-like carbon produced by inductively coupled plasma assisted chemical vapor deposition

Diamond-like carbon (DLC) films were deposited by inductively coupled plasma (ICP) assisted CVD using a gas mixture of Ar and C 2H 2. The film showed one (37 GPa) of the highest hardness values for a DLC film produced by CVD at the optimum process condition. The film hardness increased rapidly with...

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Veröffentlicht in:	Surface & coatings technology 2005-04, Vol.193 (1), p.255-258
Hauptverfasser:	Kim, H., Jung, D.H., Park, B., Yoo, K.C., Lee, J.J., Joo, J.H.
Format:	Artikel
Sprache:	eng
Schlagworte:	Cross-disciplinary physics: materials science rheology CVD Diamond-like carbon Exact sciences and technology Inductively coupled plasma Materials science Other topics in materials science Physics
Online-Zugang:	Volltext
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