Study of the electrodeposition of rhenium thin films by electrochemical quartz microbalance and X-ray photoelectron spectroscopy
Rhenium thin films were prepared by electrodeposition from an aqueous solution containing 0.1 M Na 2SO 4+H 2SO 4, pH 2 in presence of y mM HReO 4. As substrates polycrystalline gold ( y=0.75 mM HReO 4) and monocrystalline n-Si(100) ( y=40 mM HReO 4) were used. The electrochemical growth of rhenium w...
Gespeichert in:
| Veröffentlicht in: | Thin solid films 2005-07, Vol.483 (1), p.50-59 |
|---|---|
| Hauptverfasser: | , , , , , , , , , |
| Format: | Artikel |
| Sprache: | eng |
| Schlagworte: | |
| Online-Zugang: | Volltext |
| Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
| container_end_page | 59 |
|---|---|
| container_issue | 1 |
| container_start_page | 50 |
| container_title | Thin solid films |
| container_volume | 483 |
| creator | Schrebler, R. Cury, P. Suárez, C. Muñoz, E. Vera, F. Córdova, R. Gómez, H. Ramos-Barrado, J.R. Leinen, D. Dalchiele, E.A. |
| description | Rhenium thin films were prepared by electrodeposition from an aqueous solution containing 0.1 M Na
2SO
4+H
2SO
4, pH 2 in presence of
y mM HReO
4. As substrates polycrystalline gold (
y=0.75 mM HReO
4) and monocrystalline n-Si(100) (
y=40 mM HReO
4) were used. The electrochemical growth of rhenium was studied by cyclic voltammetry and electrochemical quartz microbalance on gold electrodes. The results found in the potential region before the hydrogen evolution reaction (her) showed that ReO
3, ReO
2 and Re
2O
3 with different hydration grades can be formed. In the potential region where the her is occurring, either on gold or n-Si(100) the electrodeposition of metallic rhenium takes place. On both substrates, rhenium films were formed by electrolysis at constant potential and X-ray photoelectron spectroscopy technique was used to characterise these deposits. It was concluded that the electrodeposited films were of metallic rhenium and only the uppermost atomic layer contained rhenium oxide species. |
| doi_str_mv | 10.1016/j.tsf.2004.12.061 |
| format | Article |
| fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_29674746</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><els_id>S0040609005000696</els_id><sourcerecordid>28598925</sourcerecordid><originalsourceid>FETCH-LOGICAL-c455t-33adaf2cb78e5464c1001eca3736a45c972e69c207fa1403760fa38299fe62cc3</originalsourceid><addsrcrecordid>eNqFkTuP1DAUhS3ESgy7_AA6N9Al-BU7FhVa8ZJWomBXorM8zrXGoyTO2g5SqPjpeJhBdFDZ1v3Ovb7nIPSSkpYSKt8c25J9ywgRLWUtkfQJ2tFe6YYpTp-iXS2QRhJNnqHnOR8JIZQxvkM_v5Z12HD0uBwAwwiupDjAEnMoIc6nQjrAHNapAmHGPoxTxvvtD-oOMAVnR_y42lR-4PpIcW9HOzvAdh7wtybZDS-HWOJFMuO8_L5kF5ftBl15O2Z4cTmv0cOH9_e3n5q7Lx8_3767a5zoutJwbgfrmdurHjohhaN1A3CWKy6t6JxWDKR2jChvqSBcSeIt75nWHiRzjl-j1-e-S4qPK-RippAdjPWnENdsmJZKKCH_D_ad7jXrKkjPYN045wTeLClMNm2GEnMKxRxNDcWcQjGUmRpK1by6NLe5uuZT9Snkv0LZC0o7Xrm3Zw6qJd8DJJNdgOrpEFL1zgwx_GPKL3M-pLk</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>28598925</pqid></control><display><type>article</type><title>Study of the electrodeposition of rhenium thin films by electrochemical quartz microbalance and X-ray photoelectron spectroscopy</title><source>Elsevier ScienceDirect Journals</source><creator>Schrebler, R. ; Cury, P. ; Suárez, C. ; Muñoz, E. ; Vera, F. ; Córdova, R. ; Gómez, H. ; Ramos-Barrado, J.R. ; Leinen, D. ; Dalchiele, E.A.</creator><creatorcontrib>Schrebler, R. ; Cury, P. ; Suárez, C. ; Muñoz, E. ; Vera, F. ; Córdova, R. ; Gómez, H. ; Ramos-Barrado, J.R. ; Leinen, D. ; Dalchiele, E.A.</creatorcontrib><description>Rhenium thin films were prepared by electrodeposition from an aqueous solution containing 0.1 M Na
2SO
4+H
2SO
4, pH 2 in presence of
y mM HReO
4. As substrates polycrystalline gold (
y=0.75 mM HReO
4) and monocrystalline n-Si(100) (
y=40 mM HReO
4) were used. The electrochemical growth of rhenium was studied by cyclic voltammetry and electrochemical quartz microbalance on gold electrodes. The results found in the potential region before the hydrogen evolution reaction (her) showed that ReO
3, ReO
2 and Re
2O
3 with different hydration grades can be formed. In the potential region where the her is occurring, either on gold or n-Si(100) the electrodeposition of metallic rhenium takes place. On both substrates, rhenium films were formed by electrolysis at constant potential and X-ray photoelectron spectroscopy technique was used to characterise these deposits. It was concluded that the electrodeposited films were of metallic rhenium and only the uppermost atomic layer contained rhenium oxide species.</description><identifier>ISSN: 0040-6090</identifier><identifier>EISSN: 1879-2731</identifier><identifier>DOI: 10.1016/j.tsf.2004.12.061</identifier><identifier>CODEN: THSFAP</identifier><language>eng</language><publisher>Lausanne: Elsevier B.V</publisher><subject>Adsorbed layers and thin films ; Condensed matter: electronic structure, electrical, magnetic, and optical properties ; Cross-disciplinary physics: materials science; rheology ; Electrochemical quartz microbalance ; Electrodeposition ; Electrodeposition, electroplating ; Electron and ion emission by liquids and solids; impact phenomena ; Exact sciences and technology ; Materials science ; Methods of deposition of films and coatings; film growth and epitaxy ; Photoemission and photoelectron spectra ; Physics ; Rhenium ; X-ray photoelectron spectroscopy</subject><ispartof>Thin solid films, 2005-07, Vol.483 (1), p.50-59</ispartof><rights>2005 Elsevier B.V.</rights><rights>2006 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c455t-33adaf2cb78e5464c1001eca3736a45c972e69c207fa1403760fa38299fe62cc3</citedby><cites>FETCH-LOGICAL-c455t-33adaf2cb78e5464c1001eca3736a45c972e69c207fa1403760fa38299fe62cc3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://dx.doi.org/10.1016/j.tsf.2004.12.061$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>314,777,781,3537,27905,27906,45976</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=16841153$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Schrebler, R.</creatorcontrib><creatorcontrib>Cury, P.</creatorcontrib><creatorcontrib>Suárez, C.</creatorcontrib><creatorcontrib>Muñoz, E.</creatorcontrib><creatorcontrib>Vera, F.</creatorcontrib><creatorcontrib>Córdova, R.</creatorcontrib><creatorcontrib>Gómez, H.</creatorcontrib><creatorcontrib>Ramos-Barrado, J.R.</creatorcontrib><creatorcontrib>Leinen, D.</creatorcontrib><creatorcontrib>Dalchiele, E.A.</creatorcontrib><title>Study of the electrodeposition of rhenium thin films by electrochemical quartz microbalance and X-ray photoelectron spectroscopy</title><title>Thin solid films</title><description>Rhenium thin films were prepared by electrodeposition from an aqueous solution containing 0.1 M Na
2SO
4+H
2SO
4, pH 2 in presence of
y mM HReO
4. As substrates polycrystalline gold (
y=0.75 mM HReO
4) and monocrystalline n-Si(100) (
y=40 mM HReO
4) were used. The electrochemical growth of rhenium was studied by cyclic voltammetry and electrochemical quartz microbalance on gold electrodes. The results found in the potential region before the hydrogen evolution reaction (her) showed that ReO
3, ReO
2 and Re
2O
3 with different hydration grades can be formed. In the potential region where the her is occurring, either on gold or n-Si(100) the electrodeposition of metallic rhenium takes place. On both substrates, rhenium films were formed by electrolysis at constant potential and X-ray photoelectron spectroscopy technique was used to characterise these deposits. It was concluded that the electrodeposited films were of metallic rhenium and only the uppermost atomic layer contained rhenium oxide species.</description><subject>Adsorbed layers and thin films</subject><subject>Condensed matter: electronic structure, electrical, magnetic, and optical properties</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Electrochemical quartz microbalance</subject><subject>Electrodeposition</subject><subject>Electrodeposition, electroplating</subject><subject>Electron and ion emission by liquids and solids; impact phenomena</subject><subject>Exact sciences and technology</subject><subject>Materials science</subject><subject>Methods of deposition of films and coatings; film growth and epitaxy</subject><subject>Photoemission and photoelectron spectra</subject><subject>Physics</subject><subject>Rhenium</subject><subject>X-ray photoelectron spectroscopy</subject><issn>0040-6090</issn><issn>1879-2731</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2005</creationdate><recordtype>article</recordtype><recordid>eNqFkTuP1DAUhS3ESgy7_AA6N9Al-BU7FhVa8ZJWomBXorM8zrXGoyTO2g5SqPjpeJhBdFDZ1v3Ovb7nIPSSkpYSKt8c25J9ywgRLWUtkfQJ2tFe6YYpTp-iXS2QRhJNnqHnOR8JIZQxvkM_v5Z12HD0uBwAwwiupDjAEnMoIc6nQjrAHNapAmHGPoxTxvvtD-oOMAVnR_y42lR-4PpIcW9HOzvAdh7wtybZDS-HWOJFMuO8_L5kF5ftBl15O2Z4cTmv0cOH9_e3n5q7Lx8_3767a5zoutJwbgfrmdurHjohhaN1A3CWKy6t6JxWDKR2jChvqSBcSeIt75nWHiRzjl-j1-e-S4qPK-RippAdjPWnENdsmJZKKCH_D_ad7jXrKkjPYN045wTeLClMNm2GEnMKxRxNDcWcQjGUmRpK1by6NLe5uuZT9Snkv0LZC0o7Xrm3Zw6qJd8DJJNdgOrpEFL1zgwx_GPKL3M-pLk</recordid><startdate>20050701</startdate><enddate>20050701</enddate><creator>Schrebler, R.</creator><creator>Cury, P.</creator><creator>Suárez, C.</creator><creator>Muñoz, E.</creator><creator>Vera, F.</creator><creator>Córdova, R.</creator><creator>Gómez, H.</creator><creator>Ramos-Barrado, J.R.</creator><creator>Leinen, D.</creator><creator>Dalchiele, E.A.</creator><general>Elsevier B.V</general><general>Elsevier Science</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7QQ</scope><scope>7SR</scope><scope>7U5</scope><scope>8FD</scope><scope>JG9</scope><scope>L7M</scope><scope>7TB</scope><scope>FR3</scope></search><sort><creationdate>20050701</creationdate><title>Study of the electrodeposition of rhenium thin films by electrochemical quartz microbalance and X-ray photoelectron spectroscopy</title><author>Schrebler, R. ; Cury, P. ; Suárez, C. ; Muñoz, E. ; Vera, F. ; Córdova, R. ; Gómez, H. ; Ramos-Barrado, J.R. ; Leinen, D. ; Dalchiele, E.A.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c455t-33adaf2cb78e5464c1001eca3736a45c972e69c207fa1403760fa38299fe62cc3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2005</creationdate><topic>Adsorbed layers and thin films</topic><topic>Condensed matter: electronic structure, electrical, magnetic, and optical properties</topic><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>Electrochemical quartz microbalance</topic><topic>Electrodeposition</topic><topic>Electrodeposition, electroplating</topic><topic>Electron and ion emission by liquids and solids; impact phenomena</topic><topic>Exact sciences and technology</topic><topic>Materials science</topic><topic>Methods of deposition of films and coatings; film growth and epitaxy</topic><topic>Photoemission and photoelectron spectra</topic><topic>Physics</topic><topic>Rhenium</topic><topic>X-ray photoelectron spectroscopy</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Schrebler, R.</creatorcontrib><creatorcontrib>Cury, P.</creatorcontrib><creatorcontrib>Suárez, C.</creatorcontrib><creatorcontrib>Muñoz, E.</creatorcontrib><creatorcontrib>Vera, F.</creatorcontrib><creatorcontrib>Córdova, R.</creatorcontrib><creatorcontrib>Gómez, H.</creatorcontrib><creatorcontrib>Ramos-Barrado, J.R.</creatorcontrib><creatorcontrib>Leinen, D.</creatorcontrib><creatorcontrib>Dalchiele, E.A.</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Ceramic Abstracts</collection><collection>Engineered Materials Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>Mechanical & Transportation Engineering Abstracts</collection><collection>Engineering Research Database</collection><jtitle>Thin solid films</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Schrebler, R.</au><au>Cury, P.</au><au>Suárez, C.</au><au>Muñoz, E.</au><au>Vera, F.</au><au>Córdova, R.</au><au>Gómez, H.</au><au>Ramos-Barrado, J.R.</au><au>Leinen, D.</au><au>Dalchiele, E.A.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Study of the electrodeposition of rhenium thin films by electrochemical quartz microbalance and X-ray photoelectron spectroscopy</atitle><jtitle>Thin solid films</jtitle><date>2005-07-01</date><risdate>2005</risdate><volume>483</volume><issue>1</issue><spage>50</spage><epage>59</epage><pages>50-59</pages><issn>0040-6090</issn><eissn>1879-2731</eissn><coden>THSFAP</coden><abstract>Rhenium thin films were prepared by electrodeposition from an aqueous solution containing 0.1 M Na
2SO
4+H
2SO
4, pH 2 in presence of
y mM HReO
4. As substrates polycrystalline gold (
y=0.75 mM HReO
4) and monocrystalline n-Si(100) (
y=40 mM HReO
4) were used. The electrochemical growth of rhenium was studied by cyclic voltammetry and electrochemical quartz microbalance on gold electrodes. The results found in the potential region before the hydrogen evolution reaction (her) showed that ReO
3, ReO
2 and Re
2O
3 with different hydration grades can be formed. In the potential region where the her is occurring, either on gold or n-Si(100) the electrodeposition of metallic rhenium takes place. On both substrates, rhenium films were formed by electrolysis at constant potential and X-ray photoelectron spectroscopy technique was used to characterise these deposits. It was concluded that the electrodeposited films were of metallic rhenium and only the uppermost atomic layer contained rhenium oxide species.</abstract><cop>Lausanne</cop><pub>Elsevier B.V</pub><doi>10.1016/j.tsf.2004.12.061</doi><tpages>10</tpages></addata></record> |
| fulltext | fulltext |
| identifier | ISSN: 0040-6090 |
| ispartof | Thin solid films, 2005-07, Vol.483 (1), p.50-59 |
| issn | 0040-6090 1879-2731 |
| language | eng |
| recordid | cdi_proquest_miscellaneous_29674746 |
| source | Elsevier ScienceDirect Journals |
| subjects | Adsorbed layers and thin films Condensed matter: electronic structure, electrical, magnetic, and optical properties Cross-disciplinary physics: materials science rheology Electrochemical quartz microbalance Electrodeposition Electrodeposition, electroplating Electron and ion emission by liquids and solids impact phenomena Exact sciences and technology Materials science Methods of deposition of films and coatings film growth and epitaxy Photoemission and photoelectron spectra Physics Rhenium X-ray photoelectron spectroscopy |
| title | Study of the electrodeposition of rhenium thin films by electrochemical quartz microbalance and X-ray photoelectron spectroscopy |
| url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-20T04%3A19%3A56IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Study%20of%20the%20electrodeposition%20of%20rhenium%20thin%20films%20by%20electrochemical%20quartz%20microbalance%20and%20X-ray%20photoelectron%20spectroscopy&rft.jtitle=Thin%20solid%20films&rft.au=Schrebler,%20R.&rft.date=2005-07-01&rft.volume=483&rft.issue=1&rft.spage=50&rft.epage=59&rft.pages=50-59&rft.issn=0040-6090&rft.eissn=1879-2731&rft.coden=THSFAP&rft_id=info:doi/10.1016/j.tsf.2004.12.061&rft_dat=%3Cproquest_cross%3E28598925%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=28598925&rft_id=info:pmid/&rft_els_id=S0040609005000696&rfr_iscdi=true |