Assembly of an aperture plate system for projection mask-less lithography

Mask-less lithography becomes more and more important to reduce cycle time and lithography costs for device prototyping and small batch ASIC manufacturing. A European consortium is developing an electron multi beam technology – called projection mask-less lithography (PML2)–for the 45 nm, 32 nm node...

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Veröffentlicht in:	Microelectronic engineering 2006-04, Vol.83 (4), p.980-983
Hauptverfasser:	Mohaupt, M., Eberhardt, R., Damm, C., Peschel, T., Tünnermann, A., Haugeneder, E., Döring, H.-J., Brandstätter, C.
Format:	Artikel
Sprache:	eng
Schlagworte:	Adjustment Alignment Aperture plate system Applied sciences Assembly Design. Technologies. Operation analysis. Testing Electronics Exact sciences and technology Flexure hinges Integrated circuits Mark detection Microelectronic fabrication (materials and surfaces technology) Projection mask-less lithography Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
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