Selective growth of vertically aligned carbon nanofibres in sub-micron patterns and Raman mapping of produced arrays

Carbon nanofibres are grown using a highly purified cobalt colloid catalyst. Nanocontact printing was used to deposit catalyst in patterns with sub-micron resolution over large areas on silicon wafers. Plasma Enhanced Chemical Vapour Deposition allows the direct growth of vertically aligned carbon n...

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Veröffentlicht in:Diamond and related materials 2006-04, Vol.15 (4), p.1023-1028
Hauptverfasser: Golovko, V.B., Cantoro, M., Hofmann, S., Kleinsorge, B., Geng, J., Jefferson, D., Ferrari, A.C., Robertson, J., Johnson, B.F.G.
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Sprache:eng
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Zusammenfassung:Carbon nanofibres are grown using a highly purified cobalt colloid catalyst. Nanocontact printing was used to deposit catalyst in patterns with sub-micron resolution over large areas on silicon wafers. Plasma Enhanced Chemical Vapour Deposition allows the direct growth of vertically aligned carbon nanofibres with good surface adhesion at lower temperatures. Production of the catalyst is described. Rutherford back-scattering detection Scanning Electron Microscopy and Transmission Electron Microscopy analysis confirmed tip-growth mechanism. Raman spectroscopy was used to map the patterned nanofibre arrays.
ISSN:0925-9635
1879-0062
DOI:10.1016/j.diamond.2005.12.045