Anisotropic residual stresses in sputtered TiN films prepared by linear periodic motion

Experiments on sputter deposition of TiN-coatings were carried out under two dynamic conditions which are commonly used in industrial applications: linear periodic motion of the substrates beneath one target or rotating substrates between two targets. The anisotropic stresses in the TiN-films were d...

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Veröffentlicht in:	Surface & coatings technology 2006-12, Vol.201 (6), p.3399-3405
Hauptverfasser:	Hubenthal, F., Stobiecki, T., Thoma, K., Röll, K.
Format:	Artikel
Sprache:	eng
Schlagworte:	Anisotropic stress Applied sciences Cross-disciplinary physics: materials science rheology Exact sciences and technology Hard coating Materials science Metals. Metallurgy Methods of deposition of films and coatings film growth and epitaxy Physics Production techniques Surface treatment Thin films TiN
Online-Zugang:	Volltext
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