Reactive pulsed laser deposition of thin molybdenum- and tungsten-nitride films

In this work reactive pulsed laser deposition of molybdenum- and tungsten-nitride thin films is investigated. Metallic targets were ablated in low-pressure (1, 10 and 100 Pa) nitrogen atmosphere by KrF excimer laser pulses (fluence ∼6.5 J/cm2). Films were deposited on silicon wafers heated to ∼25, 2...

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Veröffentlicht in:	Thin solid films 2005-02, Vol.473 (1), p.16-23
Hauptverfasser:	Bereznai, M., Tóth, Z., Caricato, A.P., Fernández, M., Luches, A., Majni, G., Mengucci, P., Nagy, P.M., Juhász, A., Nánai, L.
Format:	Artikel
Sprache:	eng
Schlagworte:	Condensed matter: electronic structure, electrical, magnetic, and optical properties Condensed matter: structure, mechanical and thermal properties Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures Exact sciences and technology Fundamental areas of phenomenology (including applications) Gas lasers including excimer and metal-vapor lasers Laser ablation Lasers Mechanical and acoustical properties of condensed matter Mechanical properties of solids Molybdenum nitride Optics Physical vapour deposition Physics Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) Tribology and hardness Tungsten nitride
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