Plasma-assisted pulsed laser deposition of carbon films: Effect of oxygen plasma on amorphous carbon film etching

Amorphous carbon (a-C) films were deposited on Si substrates by oxygen plasma-assisted pulsed laser deposition (oxygen PAPLD) technique and were compared with those deposited by PLD in oxygen gas. The film properties were characterized by spectroscopic ellipsometry and X-ray photoelectron spectrosco...

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Veröffentlicht in:	Thin solid films 2006-05, Vol.506 (Complete), p.96-100
Hauptverfasser:	Itoh, M., Suda, Y., Bratescu, M.A., Sakai, Y.
Format:	Artikel
Sprache:	eng
Schlagworte:	Carbon Etching Laser ablation X-ray photoelectron spectroscopy (XPS)
Online-Zugang:	Volltext
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