Nanofabrication of protein-patterned substrates for future cell adhesion experiments
A method for fabricating sub-micrometer size adhesion sites for future experiments in cell biology is presented. Glass substrates were coated with a thin layer of InSnO and SiO 2. The SiO 2 was structured by means of electron beam lithography and reactive ion etching, exposing sub-micrometer patches...
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Veröffentlicht in: | Microelectronic engineering 2005-03, Vol.78, p.582-586 |
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Hauptverfasser: | , , , , , , |
Format: | Artikel |
Sprache: | eng |
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Zusammenfassung: | A method for fabricating sub-micrometer size adhesion sites for future experiments in cell biology is presented. Glass substrates were coated with a thin layer of InSnO and SiO
2. The SiO
2 was structured by means of electron beam lithography and reactive ion etching, exposing sub-micrometer patches of the underlying InSnO. Dodecylphosphate, to which proteins can bind, was selectively adsorbed on these InSnO structures, whereas poly-
l-lysine-
g-poly(ethylene glycol) was used to passivate the surrounding SiO
2 against protein adsorption. The effectiveness of the process was investigated by fluorescent microscopy and scanning near-field optical microscopy on substrates which have been exposed to fluorescently labeled streptavidin. |
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ISSN: | 0167-9317 1873-5568 |
DOI: | 10.1016/j.mee.2004.12.073 |