Nanofabrication of protein-patterned substrates for future cell adhesion experiments

A method for fabricating sub-micrometer size adhesion sites for future experiments in cell biology is presented. Glass substrates were coated with a thin layer of InSnO and SiO 2. The SiO 2 was structured by means of electron beam lithography and reactive ion etching, exposing sub-micrometer patches...

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Veröffentlicht in:Microelectronic engineering 2005-03, Vol.78, p.582-586
Hauptverfasser: Künzi, P.A., Lussi, J., Aeschimann, L., Danuser, G., Textor, M., de Rooij, N.F., Staufer, U.
Format: Artikel
Sprache:eng
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Zusammenfassung:A method for fabricating sub-micrometer size adhesion sites for future experiments in cell biology is presented. Glass substrates were coated with a thin layer of InSnO and SiO 2. The SiO 2 was structured by means of electron beam lithography and reactive ion etching, exposing sub-micrometer patches of the underlying InSnO. Dodecylphosphate, to which proteins can bind, was selectively adsorbed on these InSnO structures, whereas poly- l-lysine- g-poly(ethylene glycol) was used to passivate the surrounding SiO 2 against protein adsorption. The effectiveness of the process was investigated by fluorescent microscopy and scanning near-field optical microscopy on substrates which have been exposed to fluorescently labeled streptavidin.
ISSN:0167-9317
1873-5568
DOI:10.1016/j.mee.2004.12.073