Influence of the bias voltage on the structure and the tribological performance of nanoscale multilayer C/Cr PVD coatings

Nanoscale multilayer C/Cr coatings have been deposited by utilising the combined steered cathodic arc/unbalanced magnetron sputtering technique. The coating microstructure and tribological performance have been investigated as a function of the bias voltage, ranging from Ub=−65 to −350 V. The XRD re...

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Veröffentlicht in:	Thin solid films 2005-03, Vol.475 (1-2), p.219-226
Hauptverfasser:	Kok, Y.N., Hovsepian, P.Eh, Luo, Q., Lewis, D.B., Wen, J.G., Petrov, I.
Format:	Artikel
Sprache:	eng
Schlagworte:	Bias voltage C/Cr coating Microstructure Sputtering Tribology
Online-Zugang:	Volltext
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