Nanostructured films of iron, tin and titanium oxides by chemical vapor deposition

Nanostructured films of iron, tin and titanium oxides were grown on glass and quartz by gas phase decomposition of [Fe(O t Bu) 3] 2, [Sn(O t Bu) 4] and [Ti(O i Pr) 4], respectively. Films obtained exhibit good adhesion and homogeneous morphology with structural features in the nanometer range. The i...

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Veröffentlicht in:	Thin solid films 2006-04, Vol.502 (1), p.88-93
Hauptverfasser:	Mathur, S., Sivakov, V., Shen, H., Barth, S., Cavelius, C., Nilsson, A., Kuhn, P.
Format:	Artikel
Sprache:	eng
Schlagworte:	Chemical vapor deposition Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Cross-disciplinary physics: materials science rheology Exact sciences and technology Functional oxide coatings Materials science Methods of deposition of films and coatings film growth and epitaxy Molecular precursor Physics
Online-Zugang:	Volltext
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