High-Temperature Lasing Characteristics of ZnO Epilayers

Coherent random lasing has been observed inside nanostructured ZnO epilayers up to 570 K. The corresponding characteristic temperature is ∼127 K. The confinement of excited carriers inside ZnO grains and the size flexibility of the random cavities maintain optical gain at high temperatures. This uni...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Advanced materials (Weinheim) 2006-03, Vol.18 (6), p.771-774
Hauptverfasser: Li, H. D., Yu, S. F., Lau, S. P., Leong, E. S. P., Yang, H. Y., Chen, T. P., Abiyasa, A. P., Ng, C. Y.
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page 774
container_issue 6
container_start_page 771
container_title Advanced materials (Weinheim)
container_volume 18
creator Li, H. D.
Yu, S. F.
Lau, S. P.
Leong, E. S. P.
Yang, H. Y.
Chen, T. P.
Abiyasa, A. P.
Ng, C. Y.
description Coherent random lasing has been observed inside nanostructured ZnO epilayers up to 570 K. The corresponding characteristic temperature is ∼127 K. The confinement of excited carriers inside ZnO grains and the size flexibility of the random cavities maintain optical gain at high temperatures. This unique behavior will lead to the development of novel ZnO UV lasers tunable over a wide wavelength range by controlling the substrate temperature.
doi_str_mv 10.1002/adma.200501693
format Article
fullrecord <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_29379171</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>29379171</sourcerecordid><originalsourceid>FETCH-LOGICAL-c3583-aa8c772f8b3cf0a553d7c6da8e546dc5018bb26ac74c9a7727f2dd1a9a3067473</originalsourceid><addsrcrecordid>eNqFkMFPwjAUhxujiYhePe_kbdiua7seERCMCBcMiZfm0XVQ3dhstyj_vSMzxJund_m-X14-hG4JHhCMo3tICxhEGDNMuKRnqEdYRMIYS3aOelhSFkoeJ5foyvt3jLHkmPdQMrPbXbgyRWUc1I0zwRy83W-D0Q4c6No462urfVBmwdt-GUwqm8PBOH-NLjLIvbn5vX30-jhZjWbhfDl9Gg3noaYsoSFAooWIsmRDdYaBMZoKzVNIDIt5qttfk80m4qBFrCW0pMiiNCUggWIuYkH76K7brVz52Rhfq8J6bfIc9qZsvIokFZII0oKDDtSu9N6ZTFXOFuAOimB1DKSOgdQpUCvITviyuTn8Q6vh-GX41w07t61jvk8uuA_FBRVMrRdTtWbj1Vg8L9QD_QEYyHi6</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>29379171</pqid></control><display><type>article</type><title>High-Temperature Lasing Characteristics of ZnO Epilayers</title><source>Wiley Online Library All Journals</source><creator>Li, H. D. ; Yu, S. F. ; Lau, S. P. ; Leong, E. S. P. ; Yang, H. Y. ; Chen, T. P. ; Abiyasa, A. P. ; Ng, C. Y.</creator><creatorcontrib>Li, H. D. ; Yu, S. F. ; Lau, S. P. ; Leong, E. S. P. ; Yang, H. Y. ; Chen, T. P. ; Abiyasa, A. P. ; Ng, C. Y.</creatorcontrib><description>Coherent random lasing has been observed inside nanostructured ZnO epilayers up to 570 K. The corresponding characteristic temperature is ∼127 K. The confinement of excited carriers inside ZnO grains and the size flexibility of the random cavities maintain optical gain at high temperatures. This unique behavior will lead to the development of novel ZnO UV lasers tunable over a wide wavelength range by controlling the substrate temperature.</description><identifier>ISSN: 0935-9648</identifier><identifier>EISSN: 1521-4095</identifier><identifier>DOI: 10.1002/adma.200501693</identifier><language>eng</language><publisher>Weinheim: WILEY-VCH Verlag</publisher><subject>Epilayers ; high-temperature ; Lasing ; Lasing, high‐temperature ; Zinc oxide</subject><ispartof>Advanced materials (Weinheim), 2006-03, Vol.18 (6), p.771-774</ispartof><rights>Copyright © 2006 WILEY‐VCH Verlag GmbH &amp; Co. KGaA, Weinheim</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c3583-aa8c772f8b3cf0a553d7c6da8e546dc5018bb26ac74c9a7727f2dd1a9a3067473</citedby><cites>FETCH-LOGICAL-c3583-aa8c772f8b3cf0a553d7c6da8e546dc5018bb26ac74c9a7727f2dd1a9a3067473</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://onlinelibrary.wiley.com/doi/full/10.1002%2Fadma.200501693$$EHTML$$P50$$Gwiley$$H</linktohtml><link.rule.ids>314,780,784,1416,27923,27924,45574</link.rule.ids></links><search><creatorcontrib>Li, H. D.</creatorcontrib><creatorcontrib>Yu, S. F.</creatorcontrib><creatorcontrib>Lau, S. P.</creatorcontrib><creatorcontrib>Leong, E. S. P.</creatorcontrib><creatorcontrib>Yang, H. Y.</creatorcontrib><creatorcontrib>Chen, T. P.</creatorcontrib><creatorcontrib>Abiyasa, A. P.</creatorcontrib><creatorcontrib>Ng, C. Y.</creatorcontrib><title>High-Temperature Lasing Characteristics of ZnO Epilayers</title><title>Advanced materials (Weinheim)</title><addtitle>Adv. Mater</addtitle><description>Coherent random lasing has been observed inside nanostructured ZnO epilayers up to 570 K. The corresponding characteristic temperature is ∼127 K. The confinement of excited carriers inside ZnO grains and the size flexibility of the random cavities maintain optical gain at high temperatures. This unique behavior will lead to the development of novel ZnO UV lasers tunable over a wide wavelength range by controlling the substrate temperature.</description><subject>Epilayers</subject><subject>high-temperature</subject><subject>Lasing</subject><subject>Lasing, high‐temperature</subject><subject>Zinc oxide</subject><issn>0935-9648</issn><issn>1521-4095</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2006</creationdate><recordtype>article</recordtype><recordid>eNqFkMFPwjAUhxujiYhePe_kbdiua7seERCMCBcMiZfm0XVQ3dhstyj_vSMzxJund_m-X14-hG4JHhCMo3tICxhEGDNMuKRnqEdYRMIYS3aOelhSFkoeJ5foyvt3jLHkmPdQMrPbXbgyRWUc1I0zwRy83W-D0Q4c6No462urfVBmwdt-GUwqm8PBOH-NLjLIvbn5vX30-jhZjWbhfDl9Gg3noaYsoSFAooWIsmRDdYaBMZoKzVNIDIt5qttfk80m4qBFrCW0pMiiNCUggWIuYkH76K7brVz52Rhfq8J6bfIc9qZsvIokFZII0oKDDtSu9N6ZTFXOFuAOimB1DKSOgdQpUCvITviyuTn8Q6vh-GX41w07t61jvk8uuA_FBRVMrRdTtWbj1Vg8L9QD_QEYyHi6</recordid><startdate>20060317</startdate><enddate>20060317</enddate><creator>Li, H. D.</creator><creator>Yu, S. F.</creator><creator>Lau, S. P.</creator><creator>Leong, E. S. P.</creator><creator>Yang, H. Y.</creator><creator>Chen, T. P.</creator><creator>Abiyasa, A. P.</creator><creator>Ng, C. Y.</creator><general>WILEY-VCH Verlag</general><general>WILEY‐VCH Verlag</general><scope>BSCLL</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope></search><sort><creationdate>20060317</creationdate><title>High-Temperature Lasing Characteristics of ZnO Epilayers</title><author>Li, H. D. ; Yu, S. F. ; Lau, S. P. ; Leong, E. S. P. ; Yang, H. Y. ; Chen, T. P. ; Abiyasa, A. P. ; Ng, C. Y.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c3583-aa8c772f8b3cf0a553d7c6da8e546dc5018bb26ac74c9a7727f2dd1a9a3067473</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2006</creationdate><topic>Epilayers</topic><topic>high-temperature</topic><topic>Lasing</topic><topic>Lasing, high‐temperature</topic><topic>Zinc oxide</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Li, H. D.</creatorcontrib><creatorcontrib>Yu, S. F.</creatorcontrib><creatorcontrib>Lau, S. P.</creatorcontrib><creatorcontrib>Leong, E. S. P.</creatorcontrib><creatorcontrib>Yang, H. Y.</creatorcontrib><creatorcontrib>Chen, T. P.</creatorcontrib><creatorcontrib>Abiyasa, A. P.</creatorcontrib><creatorcontrib>Ng, C. Y.</creatorcontrib><collection>Istex</collection><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Advanced materials (Weinheim)</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Li, H. D.</au><au>Yu, S. F.</au><au>Lau, S. P.</au><au>Leong, E. S. P.</au><au>Yang, H. Y.</au><au>Chen, T. P.</au><au>Abiyasa, A. P.</au><au>Ng, C. Y.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>High-Temperature Lasing Characteristics of ZnO Epilayers</atitle><jtitle>Advanced materials (Weinheim)</jtitle><addtitle>Adv. Mater</addtitle><date>2006-03-17</date><risdate>2006</risdate><volume>18</volume><issue>6</issue><spage>771</spage><epage>774</epage><pages>771-774</pages><issn>0935-9648</issn><eissn>1521-4095</eissn><abstract>Coherent random lasing has been observed inside nanostructured ZnO epilayers up to 570 K. The corresponding characteristic temperature is ∼127 K. The confinement of excited carriers inside ZnO grains and the size flexibility of the random cavities maintain optical gain at high temperatures. This unique behavior will lead to the development of novel ZnO UV lasers tunable over a wide wavelength range by controlling the substrate temperature.</abstract><cop>Weinheim</cop><pub>WILEY-VCH Verlag</pub><doi>10.1002/adma.200501693</doi><tpages>4</tpages></addata></record>
fulltext fulltext
identifier ISSN: 0935-9648
ispartof Advanced materials (Weinheim), 2006-03, Vol.18 (6), p.771-774
issn 0935-9648
1521-4095
language eng
recordid cdi_proquest_miscellaneous_29379171
source Wiley Online Library All Journals
subjects Epilayers
high-temperature
Lasing
Lasing, high‐temperature
Zinc oxide
title High-Temperature Lasing Characteristics of ZnO Epilayers
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-11T19%3A56%3A34IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=High-Temperature%20Lasing%20Characteristics%20of%20ZnO%20Epilayers&rft.jtitle=Advanced%20materials%20(Weinheim)&rft.au=Li,%20H.%E2%80%89D.&rft.date=2006-03-17&rft.volume=18&rft.issue=6&rft.spage=771&rft.epage=774&rft.pages=771-774&rft.issn=0935-9648&rft.eissn=1521-4095&rft_id=info:doi/10.1002/adma.200501693&rft_dat=%3Cproquest_cross%3E29379171%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=29379171&rft_id=info:pmid/&rfr_iscdi=true