Dynamic budget analysis of multiple parameters in a lithography system based on the superposition of light intensity fluctuations

Lithography is one of the most critical processes in the manufacturing of micro- and nano-devices. As device critical dimensions continue to shrink, variations in system parameters during the lithography process often result in heavy deviations from the intended targets, making control of these para...

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Veröffentlicht in:	Optics express 2024-02, Vol.32 (4), p.5323-5338
Hauptverfasser:	Wang, Jiashuo, Su, Xiaojing, Dong, Lisong, Fan, Taian, Wei, Yayi
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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