SiO2 thin film deposition on the inner surface of a poly(tetra-fluoroethylene) narrow tube by atmospheric-pressure glow microplasma

SiO2 thin films were deposited on the inner surfaces of a commercial poly(tetrafluoroethylene) narrow tube with an inner diameter of 0.5 mm using tetraethoxysilane/O2 feedstock gases and He carrier gas by atmospheric-pressure microplasma-enhanced chemical vapor deposition. A glow microplasma was gen...

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Veröffentlicht in:	Thin solid films 2006-12, Vol.515 (4), p.1394-1399
Hauptverfasser:	Yoshiki, Hiroyuki, Abe, Kazunori, Mitsui, Toshiaki
Format:	Artikel
Sprache:	eng
Schlagworte:	Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Cross-disciplinary physics: materials science rheology Electric discharges Exact sciences and technology Glow discharge Glow corona Ion and electron beam-assisted deposition ion plating Materials science Methods of deposition of films and coatings film growth and epitaxy Physics Physics of gases, plasmas and electric discharges Physics of plasmas and electric discharges Plasma applications Plasma processing and deposition Plasma-based ion implantation and deposition Polymers Silicon oxide
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