GaN nanowires: CVD synthesis and properties
The growth of GaN nanowires from Ga and NH 3 sources in the flow of Ar carrier gas using a chemical vapor deposition (CVD) system was systematically studied. The substrates used were Si(111) and Si(100). Fabricated nanowires were characterized by scanning electron microscopy (SEM), transmission elec...
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Veröffentlicht in: | Thin solid films 2006-11, Vol.515 (3), p.984-989 |
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Format: | Artikel |
Sprache: | eng |
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