A model of clustering of phosphorus atoms in silicon

A model of phosphorus clustering during high concentration diffusion in silicon is proposed and analyzed. The main feature of this model is the assumption that negatively charged phosphorus clusters can be formed. The formation of singly negatively charged clusters incorporating one phosphorus atom...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Materials science & engineering. B, Solid-state materials for advanced technology Solid-state materials for advanced technology, 2005-11, Vol.123 (2), p.176-180
Hauptverfasser: Velichko, O.I., Dobrushkin, V.A., Pakula, L.
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page 180
container_issue 2
container_start_page 176
container_title Materials science & engineering. B, Solid-state materials for advanced technology
container_volume 123
creator Velichko, O.I.
Dobrushkin, V.A.
Pakula, L.
description A model of phosphorus clustering during high concentration diffusion in silicon is proposed and analyzed. The main feature of this model is the assumption that negatively charged phosphorus clusters can be formed. The formation of singly negatively charged clusters incorporating one phosphorus atom and two phosphorus atoms was investigated. To compare the model with the experimental data the total phosphorus concentration, concentration of clustered impurity atoms, and electron density depending on the concentration of substitutionally dissolved phosphorus atoms were calculated for both cluster species. Consideration of clusters with negative charge makes it possible to explain the appearance of “plateau” on the charge carrier profiles obtained at high concentration phosphorus diffusion. The parameters describing phosphorus clustering at a temperature of 920  ° C were extracted from fitting the calculated values of the electron density to the experimental data.
doi_str_mv 10.1016/j.mseb.2005.06.014
format Article
fullrecord <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_29269548</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><els_id>S0921510705003612</els_id><sourcerecordid>29269548</sourcerecordid><originalsourceid>FETCH-LOGICAL-c331t-78d190e60f89b8fde5ff7847f3f27ce01129903e49b6bbab9f97a3b7973649183</originalsourceid><addsrcrecordid>eNp9kE1LxDAQhoMouK7-AU89eWudfLRpwMsifsGCFz2HNp1olrZZM63gv3fLevYwvAy8z8A8jF1zKDjw6nZXDIRtIQDKAqoCuDphK15rmSuj1ClbgRE8Lznoc3ZBtAMALoRYMbXJhthhn0WfuX6mCVMYP5Zt_xnpMGmmrJniQFkYMwp9cHG8ZGe-6Qmv_nLN3h8f3u6f8-3r08v9Zps7KfmU67rjBrACX5u29h2W3utaaS-90A6Bc2EMSFSmrdq2aY03upGtNlpWyvBartnN8e4-xa8ZabJDIId934wYZ7LCiMqUaimKY9GlSJTQ230KQ5N-LAe7CLI7uwiyiyALlT0IOkB3RwgPL3wHTJZcwNFhFxK6yXYx_If_AmKPbe0</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>29269548</pqid></control><display><type>article</type><title>A model of clustering of phosphorus atoms in silicon</title><source>Access via ScienceDirect (Elsevier)</source><creator>Velichko, O.I. ; Dobrushkin, V.A. ; Pakula, L.</creator><creatorcontrib>Velichko, O.I. ; Dobrushkin, V.A. ; Pakula, L.</creatorcontrib><description>A model of phosphorus clustering during high concentration diffusion in silicon is proposed and analyzed. The main feature of this model is the assumption that negatively charged phosphorus clusters can be formed. The formation of singly negatively charged clusters incorporating one phosphorus atom and two phosphorus atoms was investigated. To compare the model with the experimental data the total phosphorus concentration, concentration of clustered impurity atoms, and electron density depending on the concentration of substitutionally dissolved phosphorus atoms were calculated for both cluster species. Consideration of clusters with negative charge makes it possible to explain the appearance of “plateau” on the charge carrier profiles obtained at high concentration phosphorus diffusion. The parameters describing phosphorus clustering at a temperature of 920  ° C were extracted from fitting the calculated values of the electron density to the experimental data.</description><identifier>ISSN: 0921-5107</identifier><identifier>EISSN: 1873-4944</identifier><identifier>DOI: 10.1016/j.mseb.2005.06.014</identifier><language>eng</language><publisher>Elsevier B.V</publisher><subject>Clusters ; Diffusion ; Doping effects ; Phosphorus ; Silicon</subject><ispartof>Materials science &amp; engineering. B, Solid-state materials for advanced technology, 2005-11, Vol.123 (2), p.176-180</ispartof><rights>2005</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c331t-78d190e60f89b8fde5ff7847f3f27ce01129903e49b6bbab9f97a3b7973649183</citedby><cites>FETCH-LOGICAL-c331t-78d190e60f89b8fde5ff7847f3f27ce01129903e49b6bbab9f97a3b7973649183</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://dx.doi.org/10.1016/j.mseb.2005.06.014$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>314,780,784,3550,27924,27925,45995</link.rule.ids></links><search><creatorcontrib>Velichko, O.I.</creatorcontrib><creatorcontrib>Dobrushkin, V.A.</creatorcontrib><creatorcontrib>Pakula, L.</creatorcontrib><title>A model of clustering of phosphorus atoms in silicon</title><title>Materials science &amp; engineering. B, Solid-state materials for advanced technology</title><description>A model of phosphorus clustering during high concentration diffusion in silicon is proposed and analyzed. The main feature of this model is the assumption that negatively charged phosphorus clusters can be formed. The formation of singly negatively charged clusters incorporating one phosphorus atom and two phosphorus atoms was investigated. To compare the model with the experimental data the total phosphorus concentration, concentration of clustered impurity atoms, and electron density depending on the concentration of substitutionally dissolved phosphorus atoms were calculated for both cluster species. Consideration of clusters with negative charge makes it possible to explain the appearance of “plateau” on the charge carrier profiles obtained at high concentration phosphorus diffusion. The parameters describing phosphorus clustering at a temperature of 920  ° C were extracted from fitting the calculated values of the electron density to the experimental data.</description><subject>Clusters</subject><subject>Diffusion</subject><subject>Doping effects</subject><subject>Phosphorus</subject><subject>Silicon</subject><issn>0921-5107</issn><issn>1873-4944</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2005</creationdate><recordtype>article</recordtype><recordid>eNp9kE1LxDAQhoMouK7-AU89eWudfLRpwMsifsGCFz2HNp1olrZZM63gv3fLevYwvAy8z8A8jF1zKDjw6nZXDIRtIQDKAqoCuDphK15rmSuj1ClbgRE8Lznoc3ZBtAMALoRYMbXJhthhn0WfuX6mCVMYP5Zt_xnpMGmmrJniQFkYMwp9cHG8ZGe-6Qmv_nLN3h8f3u6f8-3r08v9Zps7KfmU67rjBrACX5u29h2W3utaaS-90A6Bc2EMSFSmrdq2aY03upGtNlpWyvBartnN8e4-xa8ZabJDIId934wYZ7LCiMqUaimKY9GlSJTQ230KQ5N-LAe7CLI7uwiyiyALlT0IOkB3RwgPL3wHTJZcwNFhFxK6yXYx_If_AmKPbe0</recordid><startdate>20051120</startdate><enddate>20051120</enddate><creator>Velichko, O.I.</creator><creator>Dobrushkin, V.A.</creator><creator>Pakula, L.</creator><general>Elsevier B.V</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope></search><sort><creationdate>20051120</creationdate><title>A model of clustering of phosphorus atoms in silicon</title><author>Velichko, O.I. ; Dobrushkin, V.A. ; Pakula, L.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c331t-78d190e60f89b8fde5ff7847f3f27ce01129903e49b6bbab9f97a3b7973649183</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2005</creationdate><topic>Clusters</topic><topic>Diffusion</topic><topic>Doping effects</topic><topic>Phosphorus</topic><topic>Silicon</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Velichko, O.I.</creatorcontrib><creatorcontrib>Dobrushkin, V.A.</creatorcontrib><creatorcontrib>Pakula, L.</creatorcontrib><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Materials science &amp; engineering. B, Solid-state materials for advanced technology</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Velichko, O.I.</au><au>Dobrushkin, V.A.</au><au>Pakula, L.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>A model of clustering of phosphorus atoms in silicon</atitle><jtitle>Materials science &amp; engineering. B, Solid-state materials for advanced technology</jtitle><date>2005-11-20</date><risdate>2005</risdate><volume>123</volume><issue>2</issue><spage>176</spage><epage>180</epage><pages>176-180</pages><issn>0921-5107</issn><eissn>1873-4944</eissn><abstract>A model of phosphorus clustering during high concentration diffusion in silicon is proposed and analyzed. The main feature of this model is the assumption that negatively charged phosphorus clusters can be formed. The formation of singly negatively charged clusters incorporating one phosphorus atom and two phosphorus atoms was investigated. To compare the model with the experimental data the total phosphorus concentration, concentration of clustered impurity atoms, and electron density depending on the concentration of substitutionally dissolved phosphorus atoms were calculated for both cluster species. Consideration of clusters with negative charge makes it possible to explain the appearance of “plateau” on the charge carrier profiles obtained at high concentration phosphorus diffusion. The parameters describing phosphorus clustering at a temperature of 920  ° C were extracted from fitting the calculated values of the electron density to the experimental data.</abstract><pub>Elsevier B.V</pub><doi>10.1016/j.mseb.2005.06.014</doi><tpages>5</tpages></addata></record>
fulltext fulltext
identifier ISSN: 0921-5107
ispartof Materials science & engineering. B, Solid-state materials for advanced technology, 2005-11, Vol.123 (2), p.176-180
issn 0921-5107
1873-4944
language eng
recordid cdi_proquest_miscellaneous_29269548
source Access via ScienceDirect (Elsevier)
subjects Clusters
Diffusion
Doping effects
Phosphorus
Silicon
title A model of clustering of phosphorus atoms in silicon
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-25T15%3A28%3A34IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=A%20model%20of%20clustering%20of%20phosphorus%20atoms%20in%20silicon&rft.jtitle=Materials%20science%20&%20engineering.%20B,%20Solid-state%20materials%20for%20advanced%20technology&rft.au=Velichko,%20O.I.&rft.date=2005-11-20&rft.volume=123&rft.issue=2&rft.spage=176&rft.epage=180&rft.pages=176-180&rft.issn=0921-5107&rft.eissn=1873-4944&rft_id=info:doi/10.1016/j.mseb.2005.06.014&rft_dat=%3Cproquest_cross%3E29269548%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=29269548&rft_id=info:pmid/&rft_els_id=S0921510705003612&rfr_iscdi=true