Growth and characterization of piezoelectric AlN thin films for diamond-based surface acoustic wave devices

We report on the preparation and structural characterization of piezoelectric films of aluminium nitride onto diamond substrates. The samples were fabricated by sequential radio frequency reactive diode sputtering processes, carried out at various temperatures, in a head vacuum system starting from...

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Veröffentlicht in:Thin solid films 2006-02, Vol.497 (1-2), p.304-308
Hauptverfasser: Benetti, M., Cannatà, D., Di Pietrantonio, F., Verona, E., Generosi, A., Paci, B., Rossi Albertini, V.
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container_end_page 308
container_issue 1-2
container_start_page 304
container_title Thin solid films
container_volume 497
creator Benetti, M.
Cannatà, D.
Di Pietrantonio, F.
Verona, E.
Generosi, A.
Paci, B.
Rossi Albertini, V.
description We report on the preparation and structural characterization of piezoelectric films of aluminium nitride onto diamond substrates. The samples were fabricated by sequential radio frequency reactive diode sputtering processes, carried out at various temperatures, in a head vacuum system starting from stechiometric targets. The structural characterization of the films was performed by energy dispersive X-ray diffraction analysis. The deposition temperature was found to play a relevant role to obtain highly textured films with the c-axis perpendicular to the substrate surface, as required by surface-acoustic-wave applications. In particular, a minimum substrate temperature of 300 °C was needed in order to obtain any internal order along the c-axis while, increasing the temperature, the AlN orientation becomes preferential. The rocking curve analysis revealed a good crystalline quality of the AlN films whose degree of epitaxy can be well described by a linearly increasing function of the temperature at which the films are grown.
doi_str_mv 10.1016/j.tsf.2005.10.073
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The samples were fabricated by sequential radio frequency reactive diode sputtering processes, carried out at various temperatures, in a head vacuum system starting from stechiometric targets. The structural characterization of the films was performed by energy dispersive X-ray diffraction analysis. The deposition temperature was found to play a relevant role to obtain highly textured films with the c-axis perpendicular to the substrate surface, as required by surface-acoustic-wave applications. In particular, a minimum substrate temperature of 300 °C was needed in order to obtain any internal order along the c-axis while, increasing the temperature, the AlN orientation becomes preferential. 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subjects Acoustoelectric effects and surface acoustic waves (saw) in piezoelectrics
Aluminium nitride
Condensed matter: electronic structure, electrical, magnetic, and optical properties
Diamond
Dielectric, piezoelectric, ferroelectric and antiferroelectric materials
Dielectrics, piezoelectrics, and ferroelectrics and their properties
Elements, oxides, nitrides, borides, carbides, chalcogenides, etc
Exact sciences and technology
Physics
Piezoelectricity and electromechanical effects
Sputtering
title Growth and characterization of piezoelectric AlN thin films for diamond-based surface acoustic wave devices
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