Fluorinated amorphous diamond-like carbon films deposited by plasma-enhanced chemical vapor deposition

Fluorinated amorphous diamond-like carbon films (a-C:F) have been prepared on room-temperature (100) Si substrates by using 13.56 MHz radio frequency plasma-enhanced chemical vapor deposition (rf PECVD), where methane (CH 4) and carbon tetrafluoride (CF 4) were used as gas precursors. The films were...

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Veröffentlicht in:	Surface & coatings technology 2005-02, Vol.191 (2), p.236-241
Hauptverfasser:	Yu, G.Q., Tay, B.K., Sun, Z.
Format:	Artikel
Sprache:	eng
Schlagworte:	Cross-disciplinary physics: materials science rheology Exact sciences and technology Fluorinated amorphous diamond-like carbon films Materials science Other topics in materials science Physics Plasma-enhanced chemical vapor deposition X-ray photoelectron spectroscopy
Online-Zugang:	Volltext
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