Fabrication of high hole-carrier density p-type ZnO thin films by N–Al co-doping
In order to obtain p-type ZnO thin films, effect of atomic ratio of Zn:N:Al on the electronic and structural characteristic of ZnO thin films was investigated. Hall measurement indicated that with the increase of Al doping, conductive type of as-grown ZnO thin films changed from n-type to p-type and...
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Veröffentlicht in: | Applied surface science 2007-02, Vol.253 (8), p.3825-3827 |
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Format: | Artikel |
Sprache: | eng |
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