Efficient High Current Process Transfer and Device Matching Strategies for sub-90nm Manufacturing

As devices scale down to 90nm and beyond, process transfer between different high current (HC) implanter platforms requires precise matching of multiple characteristics of implant process environment. Matching traditional recipe parameters such as dose, energy and tilt/twist no longer secures achiev...

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Bibliographische Detailangaben

Hauptverfasser:	Lee, Dennis, Loh, Nyensiong, Tan, Miow Chin, Shim, Kyuha, Falk, Scott, Guo, Baonian, Jillson, Scott, Wong, Bryan, Loh, Kherchong, Mehta, Sandeep, Erokhin, Yuri
Format:	Tagungsbericht
Sprache:	eng
Online-Zugang:	Volltext
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