Detection of precursor molecules in the Metal Chloride Reduction CVD of Cu

Chemical kinetics of a novel metal CVD method (Metal Chloride Reduction CVD; MCR-CVD) has been investigated. The MCR-CVD can be applied to thin-film deposition of copper and various other metals. In the MCR-CVD process of Cu, gaseous copper chlorides produced by chlorine-assisted etching of a copper...

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Veröffentlicht in:	Surface & coatings technology 2006-02, Vol.200 (10), p.3117-3121
Hauptverfasser:	Hibi, Atsushi, Tonegawa, Hiroshi, Tonokura, Kenichi, Satake, Kouji, Sakamoto, Hitoshi, Koshi, Mitsuo
Format:	Artikel
Sprache:	eng
Schlagworte:	Copper CVD Cross-disciplinary physics: materials science rheology CuCl Electron impact ionization mass spectrometry Exact sciences and technology Laser Induced Fluorescence Materials science Metal Chloride Reduction CVD Other topics in materials science Physics
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