Deep oxidation of aluminum by a DC oxygen plasma
A novel way of oxidising aluminum using a DC oxygen plasma is described. The oxidation is carried out with a pressure of ∼0.1 bar, an electrical current lower than 3 mA, and a working distance between the electrodes of the order of 1 cm. The pressure is seen to have a stronger influence on the resul...
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| Veröffentlicht in: | Surface & coatings technology 2005-05, Vol.195 (2), p.168-175 |
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| container_title | Surface & coatings technology |
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| creator | Baier-Saip, J.A. Avila, J.I. Tarrach, G. Cabrera, A.L. Fuenzalida, V. Zarate, R.A. Schuller, I.K. |
| description | A novel way of oxidising aluminum using a DC oxygen plasma is described. The oxidation is carried out with a pressure of ∼0.1 bar, an electrical current lower than 3 mA, and a working distance between the electrodes of the order of 1 cm. The pressure is seen to have a stronger influence on the results than the working distance. The process does not damage the surface and only minor differences are detected in the topography due to the expansion of the aluminum during oxidation. It is shown that the region affected by the plasma results in a ∼50-nm-thick amorphous aluminum oxide layer (OL). We find that the kinetics of oxide growth can be described as having two main sources, the main one originating from the plasma and the other from the surrounding ionized gas. |
| doi_str_mv | 10.1016/j.surfcoat.2004.06.020 |
| format | Article |
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The oxidation is carried out with a pressure of ∼0.1 bar, an electrical current lower than 3 mA, and a working distance between the electrodes of the order of 1 cm. The pressure is seen to have a stronger influence on the results than the working distance. The process does not damage the surface and only minor differences are detected in the topography due to the expansion of the aluminum during oxidation. It is shown that the region affected by the plasma results in a ∼50-nm-thick amorphous aluminum oxide layer (OL). We find that the kinetics of oxide growth can be described as having two main sources, the main one originating from the plasma and the other from the surrounding ionized gas.</description><identifier>ISSN: 0257-8972</identifier><identifier>EISSN: 1879-3347</identifier><identifier>DOI: 10.1016/j.surfcoat.2004.06.020</identifier><identifier>CODEN: SCTEEJ</identifier><language>eng</language><publisher>Lausanne: Elsevier B.V</publisher><subject>[B] AES ; [B] AFM ; [B] Amorphous ; [B] Raman scattering spectroscopy ; [B] SEM ; [D] Aluminum oxide ; Applied sciences ; Corrosion ; Corrosion environments ; Cross-disciplinary physics: materials science; rheology ; Exact sciences and technology ; Materials science ; Metals. 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The oxidation is carried out with a pressure of ∼0.1 bar, an electrical current lower than 3 mA, and a working distance between the electrodes of the order of 1 cm. The pressure is seen to have a stronger influence on the results than the working distance. The process does not damage the surface and only minor differences are detected in the topography due to the expansion of the aluminum during oxidation. It is shown that the region affected by the plasma results in a ∼50-nm-thick amorphous aluminum oxide layer (OL). We find that the kinetics of oxide growth can be described as having two main sources, the main one originating from the plasma and the other from the surrounding ionized gas.</description><subject>[B] AES</subject><subject>[B] AFM</subject><subject>[B] Amorphous</subject><subject>[B] Raman scattering spectroscopy</subject><subject>[B] SEM</subject><subject>[D] Aluminum oxide</subject><subject>Applied sciences</subject><subject>Corrosion</subject><subject>Corrosion environments</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Exact sciences and technology</subject><subject>Materials science</subject><subject>Metals. 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Metallurgy</topic><topic>Other topics in materials science</topic><topic>Physics</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Baier-Saip, J.A.</creatorcontrib><creatorcontrib>Avila, J.I.</creatorcontrib><creatorcontrib>Tarrach, G.</creatorcontrib><creatorcontrib>Cabrera, A.L.</creatorcontrib><creatorcontrib>Fuenzalida, V.</creatorcontrib><creatorcontrib>Zarate, R.A.</creatorcontrib><creatorcontrib>Schuller, I.K.</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Aluminium Industry Abstracts</collection><collection>Ceramic Abstracts</collection><collection>Electronics & Communications Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>Mechanical & Transportation Engineering Abstracts</collection><collection>Engineering Research Database</collection><jtitle>Surface & coatings technology</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Baier-Saip, J.A.</au><au>Avila, J.I.</au><au>Tarrach, G.</au><au>Cabrera, A.L.</au><au>Fuenzalida, V.</au><au>Zarate, R.A.</au><au>Schuller, I.K.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Deep oxidation of aluminum by a DC oxygen plasma</atitle><jtitle>Surface & coatings technology</jtitle><date>2005-05-31</date><risdate>2005</risdate><volume>195</volume><issue>2</issue><spage>168</spage><epage>175</epage><pages>168-175</pages><issn>0257-8972</issn><eissn>1879-3347</eissn><coden>SCTEEJ</coden><abstract>A novel way of oxidising aluminum using a DC oxygen plasma is described. The oxidation is carried out with a pressure of ∼0.1 bar, an electrical current lower than 3 mA, and a working distance between the electrodes of the order of 1 cm. The pressure is seen to have a stronger influence on the results than the working distance. The process does not damage the surface and only minor differences are detected in the topography due to the expansion of the aluminum during oxidation. It is shown that the region affected by the plasma results in a ∼50-nm-thick amorphous aluminum oxide layer (OL). We find that the kinetics of oxide growth can be described as having two main sources, the main one originating from the plasma and the other from the surrounding ionized gas.</abstract><cop>Lausanne</cop><pub>Elsevier B.V</pub><doi>10.1016/j.surfcoat.2004.06.020</doi><tpages>8</tpages></addata></record> |
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| ispartof | Surface & coatings technology, 2005-05, Vol.195 (2), p.168-175 |
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| subjects | [B] AES [B] AFM [B] Amorphous [B] Raman scattering spectroscopy [B] SEM [D] Aluminum oxide Applied sciences Corrosion Corrosion environments Cross-disciplinary physics: materials science rheology Exact sciences and technology Materials science Metals. Metallurgy Other topics in materials science Physics |
| title | Deep oxidation of aluminum by a DC oxygen plasma |
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