Plasma Chemistry in an Atmospheric Pressure Ar/NH3 Dielectric Barrier Discharge

An atmospheric pressure dielectric barrier discharge (DBD) in Ar/NH3 (0.1–10%) mixtures with a parallel plate electrode geometry was studied. The plasma was investigated by emission and absorption spectroscopy in the UV spectral range. Discharge current and voltage were measured as well. UV absorpti...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Plasma processes and polymers 2005-03, Vol.2 (3), p.193-200
Hauptverfasser: Fateev, Alexander, Leipold, Frank, Kusano, Yukihiro, Stenum, Bjarne, Tsakadze, Erekle, Bindslev, Henrik
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page 200
container_issue 3
container_start_page 193
container_title Plasma processes and polymers
container_volume 2
creator Fateev, Alexander
Leipold, Frank
Kusano, Yukihiro
Stenum, Bjarne
Tsakadze, Erekle
Bindslev, Henrik
description An atmospheric pressure dielectric barrier discharge (DBD) in Ar/NH3 (0.1–10%) mixtures with a parallel plate electrode geometry was studied. The plasma was investigated by emission and absorption spectroscopy in the UV spectral range. Discharge current and voltage were measured as well. UV absorption spectroscopy was also employed for the detection of stable products in the exhaust gas. To clarify the different processes for ammonia decomposition, N2 (2–10%) was added to the plasma. Modeling of the chemical kinetics in an Ar/NH3 plasma was performed as well. The dominant stable products of an atmospheric pressure Ar/NH3 DBD are H2, N2 and N2H4. The hydrazine (N2H4) concentration in the plasma and in the exhaust gases at various ammonia concentrations and different discharge powers was measured. Thermal N2H4 decomposition into NH2 radicals may be used for NOx reduction processes. The differences in the optical emission spectra of NH radicals formed in Ar/NH3 plasma with various ammonia concentrations (0.7, 2, and 10%) were associated with different excitation mechanisms of NH radicals.
doi_str_mv 10.1002/ppap.200400051
format Article
fullrecord <record><control><sourceid>proquest_wiley</sourceid><recordid>TN_cdi_proquest_miscellaneous_29171145</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>29171145</sourcerecordid><originalsourceid>FETCH-LOGICAL-i3401-f12d3856350fe31b31e6df7c03ade8ac2e4bc19af2695d76a252b5e5b5c0d33f3</originalsourceid><addsrcrecordid>eNo9kElPwzAQhS0EEqVw5ZwTt7RjO85yTAu0oKqNEIvExXKcCTUkbbBTQf89qYpymu29p9FHyDWFEQVg46ZRzYgBBAAg6AkZ0JAyP47D5LTvBZyTC-c-ATiIGAZklVXK1cqbrrE2rrV7z2w8tfHStt66Zo3WaC-z6NzOopfa8XLOvVuDFer2cJooaw3abuX0WtkPvCRnpaocXv3XIXm5v3uezv3FavYwTRe-4QFQv6Ss4LEIuYASOc05xbAoIw1cFRgrzTDINU1UycJEFFGomGC5QJELDQXnJR-Sm2NuY7ffO3St7N7XWFVqg9udkyyhEaWB6ITJUfhjKtzLxppa2b2kIA_Q5AGa7KHJLEuzfuq8_tHbkcHf3qvslwwjHgn5tpzJgL8_8cnjRL7yPz-5cew</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>29171145</pqid></control><display><type>article</type><title>Plasma Chemistry in an Atmospheric Pressure Ar/NH3 Dielectric Barrier Discharge</title><source>Wiley Online Library Journals Frontfile Complete</source><creator>Fateev, Alexander ; Leipold, Frank ; Kusano, Yukihiro ; Stenum, Bjarne ; Tsakadze, Erekle ; Bindslev, Henrik</creator><creatorcontrib>Fateev, Alexander ; Leipold, Frank ; Kusano, Yukihiro ; Stenum, Bjarne ; Tsakadze, Erekle ; Bindslev, Henrik</creatorcontrib><description>An atmospheric pressure dielectric barrier discharge (DBD) in Ar/NH3 (0.1–10%) mixtures with a parallel plate electrode geometry was studied. The plasma was investigated by emission and absorption spectroscopy in the UV spectral range. Discharge current and voltage were measured as well. UV absorption spectroscopy was also employed for the detection of stable products in the exhaust gas. To clarify the different processes for ammonia decomposition, N2 (2–10%) was added to the plasma. Modeling of the chemical kinetics in an Ar/NH3 plasma was performed as well. The dominant stable products of an atmospheric pressure Ar/NH3 DBD are H2, N2 and N2H4. The hydrazine (N2H4) concentration in the plasma and in the exhaust gases at various ammonia concentrations and different discharge powers was measured. Thermal N2H4 decomposition into NH2 radicals may be used for NOx reduction processes. The differences in the optical emission spectra of NH radicals formed in Ar/NH3 plasma with various ammonia concentrations (0.7, 2, and 10%) were associated with different excitation mechanisms of NH radicals.</description><identifier>ISSN: 1612-8850</identifier><identifier>EISSN: 1612-8869</identifier><identifier>DOI: 10.1002/ppap.200400051</identifier><language>eng</language><publisher>Weinheim: WILEY-VCH Verlag</publisher><subject>absorption spectroscopy ; DeNOx ; dielectric barrier discharges (DBD) ; electrical and spectroscopic diagnostics ; emission spectroscopy ; kinetics ; modeling</subject><ispartof>Plasma processes and polymers, 2005-03, Vol.2 (3), p.193-200</ispartof><rights>Copyright © 2005 WILEY‐VCH Verlag GmbH &amp; Co. KGaA, Weinheim</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://onlinelibrary.wiley.com/doi/pdf/10.1002%2Fppap.200400051$$EPDF$$P50$$Gwiley$$H</linktopdf><linktohtml>$$Uhttps://onlinelibrary.wiley.com/doi/full/10.1002%2Fppap.200400051$$EHTML$$P50$$Gwiley$$H</linktohtml><link.rule.ids>314,777,781,1412,27905,27906,45555,45556</link.rule.ids></links><search><creatorcontrib>Fateev, Alexander</creatorcontrib><creatorcontrib>Leipold, Frank</creatorcontrib><creatorcontrib>Kusano, Yukihiro</creatorcontrib><creatorcontrib>Stenum, Bjarne</creatorcontrib><creatorcontrib>Tsakadze, Erekle</creatorcontrib><creatorcontrib>Bindslev, Henrik</creatorcontrib><title>Plasma Chemistry in an Atmospheric Pressure Ar/NH3 Dielectric Barrier Discharge</title><title>Plasma processes and polymers</title><addtitle>Plasma Processes Polym</addtitle><description>An atmospheric pressure dielectric barrier discharge (DBD) in Ar/NH3 (0.1–10%) mixtures with a parallel plate electrode geometry was studied. The plasma was investigated by emission and absorption spectroscopy in the UV spectral range. Discharge current and voltage were measured as well. UV absorption spectroscopy was also employed for the detection of stable products in the exhaust gas. To clarify the different processes for ammonia decomposition, N2 (2–10%) was added to the plasma. Modeling of the chemical kinetics in an Ar/NH3 plasma was performed as well. The dominant stable products of an atmospheric pressure Ar/NH3 DBD are H2, N2 and N2H4. The hydrazine (N2H4) concentration in the plasma and in the exhaust gases at various ammonia concentrations and different discharge powers was measured. Thermal N2H4 decomposition into NH2 radicals may be used for NOx reduction processes. The differences in the optical emission spectra of NH radicals formed in Ar/NH3 plasma with various ammonia concentrations (0.7, 2, and 10%) were associated with different excitation mechanisms of NH radicals.</description><subject>absorption spectroscopy</subject><subject>DeNOx</subject><subject>dielectric barrier discharges (DBD)</subject><subject>electrical and spectroscopic diagnostics</subject><subject>emission spectroscopy</subject><subject>kinetics</subject><subject>modeling</subject><issn>1612-8850</issn><issn>1612-8869</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2005</creationdate><recordtype>article</recordtype><recordid>eNo9kElPwzAQhS0EEqVw5ZwTt7RjO85yTAu0oKqNEIvExXKcCTUkbbBTQf89qYpymu29p9FHyDWFEQVg46ZRzYgBBAAg6AkZ0JAyP47D5LTvBZyTC-c-ATiIGAZklVXK1cqbrrE2rrV7z2w8tfHStt66Zo3WaC-z6NzOopfa8XLOvVuDFer2cJooaw3abuX0WtkPvCRnpaocXv3XIXm5v3uezv3FavYwTRe-4QFQv6Ss4LEIuYASOc05xbAoIw1cFRgrzTDINU1UycJEFFGomGC5QJELDQXnJR-Sm2NuY7ffO3St7N7XWFVqg9udkyyhEaWB6ITJUfhjKtzLxppa2b2kIA_Q5AGa7KHJLEuzfuq8_tHbkcHf3qvslwwjHgn5tpzJgL8_8cnjRL7yPz-5cew</recordid><startdate>20050331</startdate><enddate>20050331</enddate><creator>Fateev, Alexander</creator><creator>Leipold, Frank</creator><creator>Kusano, Yukihiro</creator><creator>Stenum, Bjarne</creator><creator>Tsakadze, Erekle</creator><creator>Bindslev, Henrik</creator><general>WILEY-VCH Verlag</general><general>WILEY‐VCH Verlag</general><scope>BSCLL</scope><scope>7SR</scope><scope>8FD</scope><scope>JG9</scope></search><sort><creationdate>20050331</creationdate><title>Plasma Chemistry in an Atmospheric Pressure Ar/NH3 Dielectric Barrier Discharge</title><author>Fateev, Alexander ; Leipold, Frank ; Kusano, Yukihiro ; Stenum, Bjarne ; Tsakadze, Erekle ; Bindslev, Henrik</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-i3401-f12d3856350fe31b31e6df7c03ade8ac2e4bc19af2695d76a252b5e5b5c0d33f3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2005</creationdate><topic>absorption spectroscopy</topic><topic>DeNOx</topic><topic>dielectric barrier discharges (DBD)</topic><topic>electrical and spectroscopic diagnostics</topic><topic>emission spectroscopy</topic><topic>kinetics</topic><topic>modeling</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Fateev, Alexander</creatorcontrib><creatorcontrib>Leipold, Frank</creatorcontrib><creatorcontrib>Kusano, Yukihiro</creatorcontrib><creatorcontrib>Stenum, Bjarne</creatorcontrib><creatorcontrib>Tsakadze, Erekle</creatorcontrib><creatorcontrib>Bindslev, Henrik</creatorcontrib><collection>Istex</collection><collection>Engineered Materials Abstracts</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><jtitle>Plasma processes and polymers</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Fateev, Alexander</au><au>Leipold, Frank</au><au>Kusano, Yukihiro</au><au>Stenum, Bjarne</au><au>Tsakadze, Erekle</au><au>Bindslev, Henrik</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Plasma Chemistry in an Atmospheric Pressure Ar/NH3 Dielectric Barrier Discharge</atitle><jtitle>Plasma processes and polymers</jtitle><addtitle>Plasma Processes Polym</addtitle><date>2005-03-31</date><risdate>2005</risdate><volume>2</volume><issue>3</issue><spage>193</spage><epage>200</epage><pages>193-200</pages><issn>1612-8850</issn><eissn>1612-8869</eissn><abstract>An atmospheric pressure dielectric barrier discharge (DBD) in Ar/NH3 (0.1–10%) mixtures with a parallel plate electrode geometry was studied. The plasma was investigated by emission and absorption spectroscopy in the UV spectral range. Discharge current and voltage were measured as well. UV absorption spectroscopy was also employed for the detection of stable products in the exhaust gas. To clarify the different processes for ammonia decomposition, N2 (2–10%) was added to the plasma. Modeling of the chemical kinetics in an Ar/NH3 plasma was performed as well. The dominant stable products of an atmospheric pressure Ar/NH3 DBD are H2, N2 and N2H4. The hydrazine (N2H4) concentration in the plasma and in the exhaust gases at various ammonia concentrations and different discharge powers was measured. Thermal N2H4 decomposition into NH2 radicals may be used for NOx reduction processes. The differences in the optical emission spectra of NH radicals formed in Ar/NH3 plasma with various ammonia concentrations (0.7, 2, and 10%) were associated with different excitation mechanisms of NH radicals.</abstract><cop>Weinheim</cop><pub>WILEY-VCH Verlag</pub><doi>10.1002/ppap.200400051</doi><tpages>8</tpages></addata></record>
fulltext fulltext
identifier ISSN: 1612-8850
ispartof Plasma processes and polymers, 2005-03, Vol.2 (3), p.193-200
issn 1612-8850
1612-8869
language eng
recordid cdi_proquest_miscellaneous_29171145
source Wiley Online Library Journals Frontfile Complete
subjects absorption spectroscopy
DeNOx
dielectric barrier discharges (DBD)
electrical and spectroscopic diagnostics
emission spectroscopy
kinetics
modeling
title Plasma Chemistry in an Atmospheric Pressure Ar/NH3 Dielectric Barrier Discharge
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-20T13%3A04%3A20IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_wiley&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Plasma%20Chemistry%20in%20an%20Atmospheric%20Pressure%20Ar/NH3%20Dielectric%20Barrier%20Discharge&rft.jtitle=Plasma%20processes%20and%20polymers&rft.au=Fateev,%20Alexander&rft.date=2005-03-31&rft.volume=2&rft.issue=3&rft.spage=193&rft.epage=200&rft.pages=193-200&rft.issn=1612-8850&rft.eissn=1612-8869&rft_id=info:doi/10.1002/ppap.200400051&rft_dat=%3Cproquest_wiley%3E29171145%3C/proquest_wiley%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=29171145&rft_id=info:pmid/&rfr_iscdi=true