Modeling Silicon on Insulator MOS Transistors with Nonrectangular-Gate Layouts
This work presents a new and simple approach for modeling silicon on insulator metal-oxide-semiconductor (MOS) dc characteristics for nonrectangular layout devices, based on decomposition of the original shape into trapezoidal parts and on an accurate but simple model of the trapezoidal layout trans...
Gespeichert in:
Veröffentlicht in: | Journal of the Electrochemical Society 2006, Vol.153 (3), p.G218-G222 |
---|---|
Hauptverfasser: | , |
Format: | Artikel |
Sprache: | eng |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
container_end_page | G222 |
---|---|
container_issue | 3 |
container_start_page | G218 |
container_title | Journal of the Electrochemical Society |
container_volume | 153 |
creator | Giacomini, R. Martino, J. A. |
description | This work presents a new and simple approach for modeling silicon on insulator metal-oxide-semiconductor (MOS) dc characteristics for nonrectangular layout devices, based on decomposition of the original shape into trapezoidal parts and on an accurate but simple model of the trapezoidal layout transistor. Analytical expressions relating geometrical parameters and terminal current and voltages are presented for several shapes, such as L, U, T, and S, and other well-known devices such as the edgeless transistor and the asymmetric trapezoidal gate transistor. The proposed closed-form analytical expressions show good agreement with measured data and three-dimensional simulation results. |
doi_str_mv | 10.1149/1.2160451 |
format | Article |
fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_29149540</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>29149540</sourcerecordid><originalsourceid>FETCH-LOGICAL-c260t-5e908c7fe47202c7db10e783305dc520dad839d5978aa0db22d925cae9fd17353</originalsourceid><addsrcrecordid>eNotkM1KAzEYRbNQsFYXvkFWgoup-ZJJM1lK0Vroz6J1HdIkUyPTpCYZpG_viIULlwuHuzgIPQCZANTyGSYUpqTmcIVGhACr6imHG3Sb89cwoanFCK1X0brOhwPe-s6bGPCQRch9p0tMeLXZ4l3SIfs8zIx_fPnE6xiSM0WHw0Claq6Lw0t9jn3Jd-i61V1295ceo4-3193svVpu5ovZy7IydEpKxZ0kjRGtqwUl1Ai7B-JEwxjh1nBKrLYNk5ZL0WhN7J5SKyk32snWgmCcjdHj_-8pxe_e5aKOPhvXdTq42GdF5SCA12QAn_5Bk2LOybXqlPxRp7MCov4sKVAXS-wX2ZRbrA</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>29149540</pqid></control><display><type>article</type><title>Modeling Silicon on Insulator MOS Transistors with Nonrectangular-Gate Layouts</title><source>IOP Publishing Journals</source><creator>Giacomini, R. ; Martino, J. A.</creator><creatorcontrib>Giacomini, R. ; Martino, J. A.</creatorcontrib><description>This work presents a new and simple approach for modeling silicon on insulator metal-oxide-semiconductor (MOS) dc characteristics for nonrectangular layout devices, based on decomposition of the original shape into trapezoidal parts and on an accurate but simple model of the trapezoidal layout transistor. Analytical expressions relating geometrical parameters and terminal current and voltages are presented for several shapes, such as L, U, T, and S, and other well-known devices such as the edgeless transistor and the asymmetric trapezoidal gate transistor. The proposed closed-form analytical expressions show good agreement with measured data and three-dimensional simulation results.</description><identifier>ISSN: 0013-4651</identifier><identifier>DOI: 10.1149/1.2160451</identifier><language>eng</language><ispartof>Journal of the Electrochemical Society, 2006, Vol.153 (3), p.G218-G222</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c260t-5e908c7fe47202c7db10e783305dc520dad839d5978aa0db22d925cae9fd17353</citedby><cites>FETCH-LOGICAL-c260t-5e908c7fe47202c7db10e783305dc520dad839d5978aa0db22d925cae9fd17353</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,776,780,4009,27902,27903,27904</link.rule.ids></links><search><creatorcontrib>Giacomini, R.</creatorcontrib><creatorcontrib>Martino, J. A.</creatorcontrib><title>Modeling Silicon on Insulator MOS Transistors with Nonrectangular-Gate Layouts</title><title>Journal of the Electrochemical Society</title><description>This work presents a new and simple approach for modeling silicon on insulator metal-oxide-semiconductor (MOS) dc characteristics for nonrectangular layout devices, based on decomposition of the original shape into trapezoidal parts and on an accurate but simple model of the trapezoidal layout transistor. Analytical expressions relating geometrical parameters and terminal current and voltages are presented for several shapes, such as L, U, T, and S, and other well-known devices such as the edgeless transistor and the asymmetric trapezoidal gate transistor. The proposed closed-form analytical expressions show good agreement with measured data and three-dimensional simulation results.</description><issn>0013-4651</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2006</creationdate><recordtype>article</recordtype><recordid>eNotkM1KAzEYRbNQsFYXvkFWgoup-ZJJM1lK0Vroz6J1HdIkUyPTpCYZpG_viIULlwuHuzgIPQCZANTyGSYUpqTmcIVGhACr6imHG3Sb89cwoanFCK1X0brOhwPe-s6bGPCQRch9p0tMeLXZ4l3SIfs8zIx_fPnE6xiSM0WHw0Claq6Lw0t9jn3Jd-i61V1295ceo4-3193svVpu5ovZy7IydEpKxZ0kjRGtqwUl1Ai7B-JEwxjh1nBKrLYNk5ZL0WhN7J5SKyk32snWgmCcjdHj_-8pxe_e5aKOPhvXdTq42GdF5SCA12QAn_5Bk2LOybXqlPxRp7MCov4sKVAXS-wX2ZRbrA</recordid><startdate>2006</startdate><enddate>2006</enddate><creator>Giacomini, R.</creator><creator>Martino, J. A.</creator><scope>AAYXX</scope><scope>CITATION</scope><scope>7SR</scope><scope>7U5</scope><scope>8BQ</scope><scope>8FD</scope><scope>JG9</scope><scope>L7M</scope></search><sort><creationdate>2006</creationdate><title>Modeling Silicon on Insulator MOS Transistors with Nonrectangular-Gate Layouts</title><author>Giacomini, R. ; Martino, J. A.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c260t-5e908c7fe47202c7db10e783305dc520dad839d5978aa0db22d925cae9fd17353</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2006</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Giacomini, R.</creatorcontrib><creatorcontrib>Martino, J. A.</creatorcontrib><collection>CrossRef</collection><collection>Engineered Materials Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Journal of the Electrochemical Society</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Giacomini, R.</au><au>Martino, J. A.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Modeling Silicon on Insulator MOS Transistors with Nonrectangular-Gate Layouts</atitle><jtitle>Journal of the Electrochemical Society</jtitle><date>2006</date><risdate>2006</risdate><volume>153</volume><issue>3</issue><spage>G218</spage><epage>G222</epage><pages>G218-G222</pages><issn>0013-4651</issn><abstract>This work presents a new and simple approach for modeling silicon on insulator metal-oxide-semiconductor (MOS) dc characteristics for nonrectangular layout devices, based on decomposition of the original shape into trapezoidal parts and on an accurate but simple model of the trapezoidal layout transistor. Analytical expressions relating geometrical parameters and terminal current and voltages are presented for several shapes, such as L, U, T, and S, and other well-known devices such as the edgeless transistor and the asymmetric trapezoidal gate transistor. The proposed closed-form analytical expressions show good agreement with measured data and three-dimensional simulation results.</abstract><doi>10.1149/1.2160451</doi></addata></record> |
fulltext | fulltext |
identifier | ISSN: 0013-4651 |
ispartof | Journal of the Electrochemical Society, 2006, Vol.153 (3), p.G218-G222 |
issn | 0013-4651 |
language | eng |
recordid | cdi_proquest_miscellaneous_29149540 |
source | IOP Publishing Journals |
title | Modeling Silicon on Insulator MOS Transistors with Nonrectangular-Gate Layouts |
url | https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-01-25T07%3A05%3A22IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Modeling%20Silicon%20on%20Insulator%20MOS%20Transistors%20with%20Nonrectangular-Gate%20Layouts&rft.jtitle=Journal%20of%20the%20Electrochemical%20Society&rft.au=Giacomini,%20R.&rft.date=2006&rft.volume=153&rft.issue=3&rft.spage=G218&rft.epage=G222&rft.pages=G218-G222&rft.issn=0013-4651&rft_id=info:doi/10.1149/1.2160451&rft_dat=%3Cproquest_cross%3E29149540%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=29149540&rft_id=info:pmid/&rfr_iscdi=true |