Mechanical characterization and stress engineering of nanocrystalline diamonds films for MEMS applications

In this work we discuss growth and properties of nanocrystalline diamond films grown with a HFCVD system on 4 in. silicon (100) wafers. Nucleation was performed by an in situ bias pretreatment with nucleation densities of more than 10(10) cm 2. Growth of nanocrystalline films has been accomplished b...

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Veröffentlicht in:	Diamond and related materials 2005-03, Vol.14 (3-7), p.411-415
Hauptverfasser:	HEMANDEZ GUILLEN, F. J, JANISCHOWSKY, Klemens, KUSTERER, Joachim, EBERT, Wolfgang, KOHN, Erhard
Format:	Artikel
Sprache:	eng
Schlagworte:	Applied sciences Chemical vapor deposition (including plasma-enhanced cvd, mocvd, etc.) Cross-disciplinary physics: materials science rheology Electronics Exact sciences and technology Materials science Methods of deposition of films and coatings film growth and epitaxy Micro- and nanoelectromechanical devices (mems/nems) Nanocrystalline materials Nanoscale materials and structures: fabrication and characterization Physics Semiconductor electronics. Microelectronics. Optoelectronics. Solid state devices
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