Loss of adhesion strength of PVD Cu films on carbon substrates after heat treatment and correlated effects on the thermal interface properties
The study of coating–substrate systems consisting of a thin copper film on a flat carbon substrate is of great interest in order to get information on the interfacial behaviour of such systems. This work is focused on the mechanical adhesion strength and the correlated interfacial thermal contact re...
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Veröffentlicht in: | Applied surface science 2006-05, Vol.252 (15), p.5432-5436 |
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container_title | Applied surface science |
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creator | Neubauer, Erich Chotikaprakhan, S. Dietzel, D. Bein, B.K. Pelzl, J. Eisenmenger-Sittner, C. Schrank, C. Korb, G. |
description | The study of coating–substrate systems consisting of a thin copper film on a flat carbon substrate is of great interest in order to get information on the interfacial behaviour of such systems. This work is focused on the mechanical adhesion strength and the correlated interfacial thermal contact resistance which are influenced by heat treatment. Using plasma-assisted pre-treatment of the carbon substrate prior to the deposition of copper coatings via physical vapor deposition (PVD), the adhesion strength between copper coatings and substrate has increased significantly, while the thermal contact resistance decreased in the as deposited state. After heat treatment at 800
°C for 1
h, considerably decreased adhesion strengths have been observed, accompanied by increased values of the thermal contact resistance. |
doi_str_mv | 10.1016/j.apsusc.2005.12.086 |
format | Article |
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h, considerably decreased adhesion strengths have been observed, accompanied by increased values of the thermal contact resistance.</description><identifier>ISSN: 0169-4332</identifier><identifier>EISSN: 1873-5584</identifier><identifier>DOI: 10.1016/j.apsusc.2005.12.086</identifier><language>eng</language><publisher>Amsterdam: Elsevier B.V</publisher><subject>Adhesion ; AFM ; Condensed matter: electronic structure, electrical, magnetic, and optical properties ; Condensed matter: structure, mechanical and thermal properties ; Cross-disciplinary physics: materials science; rheology ; Exact sciences and technology ; Interface ; Photothermal measurements ; Physics ; PVD coating ; Surface topography ; Thermal transport properties</subject><ispartof>Applied surface science, 2006-05, Vol.252 (15), p.5432-5436</ispartof><rights>2005 Elsevier B.V.</rights><rights>2006 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c367t-ff7fa5e317cd8dc56fdb42e5872da2855042eed806590f99c7d4e67d228f23893</citedby><cites>FETCH-LOGICAL-c367t-ff7fa5e317cd8dc56fdb42e5872da2855042eed806590f99c7d4e67d228f23893</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://www.sciencedirect.com/science/article/pii/S0169433205017642$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>309,310,314,776,780,785,786,3537,23909,23910,25118,27901,27902,65534</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=17919575$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Neubauer, Erich</creatorcontrib><creatorcontrib>Chotikaprakhan, S.</creatorcontrib><creatorcontrib>Dietzel, D.</creatorcontrib><creatorcontrib>Bein, B.K.</creatorcontrib><creatorcontrib>Pelzl, J.</creatorcontrib><creatorcontrib>Eisenmenger-Sittner, C.</creatorcontrib><creatorcontrib>Schrank, C.</creatorcontrib><creatorcontrib>Korb, G.</creatorcontrib><title>Loss of adhesion strength of PVD Cu films on carbon substrates after heat treatment and correlated effects on the thermal interface properties</title><title>Applied surface science</title><description>The study of coating–substrate systems consisting of a thin copper film on a flat carbon substrate is of great interest in order to get information on the interfacial behaviour of such systems. This work is focused on the mechanical adhesion strength and the correlated interfacial thermal contact resistance which are influenced by heat treatment. Using plasma-assisted pre-treatment of the carbon substrate prior to the deposition of copper coatings via physical vapor deposition (PVD), the adhesion strength between copper coatings and substrate has increased significantly, while the thermal contact resistance decreased in the as deposited state. After heat treatment at 800
°C for 1
h, considerably decreased adhesion strengths have been observed, accompanied by increased values of the thermal contact resistance.</description><subject>Adhesion</subject><subject>AFM</subject><subject>Condensed matter: electronic structure, electrical, magnetic, and optical properties</subject><subject>Condensed matter: structure, mechanical and thermal properties</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Exact sciences and technology</subject><subject>Interface</subject><subject>Photothermal measurements</subject><subject>Physics</subject><subject>PVD coating</subject><subject>Surface topography</subject><subject>Thermal transport properties</subject><issn>0169-4332</issn><issn>1873-5584</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2006</creationdate><recordtype>article</recordtype><recordid>eNp9kMGu1CAUhhujiePVN3DBRnftBVoKbEzMePWaTKILdUvOwMFh0tIRqIkv4TNLnZu4c0EI8P3_CV_TvGS0Y5SNt-cOLnnNtuOUio7xjqrxUbNjSvatEGp43Owqptuh7_nT5lnOZ0oZr6-75vdhyZksnoA7YQ5LJLkkjN_Labv8_O0d2a_Eh2muUCQW0nFD1mOloGAm4AsmckIopOagzBgLgeiIXVLCqTKOoPdoy9-CcsJtpRkmEmKNerBILmm5YCoB8_PmiYcp44uH_ab5-v7uy_6-PXz68HH_9tDafpSl9V56ENgzaZ1yVozeHQeOQknugCshaD2hU3QUmnqtrXQDjtJxrjzvle5vmtfX3jr6x4q5mDlki9MEEZc1G65ZHaRpBYcraFMVldCbSwozpF-GUbPJN2dzlW82-YZxU-XX2KuHfsgWJp8g2pD_ZaVmWkhRuTdXDutnfwZMJtuA0aILqTozbgn_H_QHVgOfjA</recordid><startdate>20060530</startdate><enddate>20060530</enddate><creator>Neubauer, Erich</creator><creator>Chotikaprakhan, S.</creator><creator>Dietzel, D.</creator><creator>Bein, B.K.</creator><creator>Pelzl, J.</creator><creator>Eisenmenger-Sittner, C.</creator><creator>Schrank, C.</creator><creator>Korb, G.</creator><general>Elsevier B.V</general><general>Elsevier Science</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7U5</scope><scope>8BQ</scope><scope>8FD</scope><scope>H8G</scope><scope>JG9</scope><scope>L7M</scope></search><sort><creationdate>20060530</creationdate><title>Loss of adhesion strength of PVD Cu films on carbon substrates after heat treatment and correlated effects on the thermal interface properties</title><author>Neubauer, Erich ; Chotikaprakhan, S. ; Dietzel, D. ; Bein, B.K. ; Pelzl, J. ; Eisenmenger-Sittner, C. ; Schrank, C. ; Korb, G.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c367t-ff7fa5e317cd8dc56fdb42e5872da2855042eed806590f99c7d4e67d228f23893</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2006</creationdate><topic>Adhesion</topic><topic>AFM</topic><topic>Condensed matter: electronic structure, electrical, magnetic, and optical properties</topic><topic>Condensed matter: structure, mechanical and thermal properties</topic><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>Exact sciences and technology</topic><topic>Interface</topic><topic>Photothermal measurements</topic><topic>Physics</topic><topic>PVD coating</topic><topic>Surface topography</topic><topic>Thermal transport properties</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Neubauer, Erich</creatorcontrib><creatorcontrib>Chotikaprakhan, S.</creatorcontrib><creatorcontrib>Dietzel, D.</creatorcontrib><creatorcontrib>Bein, B.K.</creatorcontrib><creatorcontrib>Pelzl, J.</creatorcontrib><creatorcontrib>Eisenmenger-Sittner, C.</creatorcontrib><creatorcontrib>Schrank, C.</creatorcontrib><creatorcontrib>Korb, G.</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>METADEX</collection><collection>Technology Research Database</collection><collection>Copper Technical Reference Library</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Applied surface science</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Neubauer, Erich</au><au>Chotikaprakhan, S.</au><au>Dietzel, D.</au><au>Bein, B.K.</au><au>Pelzl, J.</au><au>Eisenmenger-Sittner, C.</au><au>Schrank, C.</au><au>Korb, G.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Loss of adhesion strength of PVD Cu films on carbon substrates after heat treatment and correlated effects on the thermal interface properties</atitle><jtitle>Applied surface science</jtitle><date>2006-05-30</date><risdate>2006</risdate><volume>252</volume><issue>15</issue><spage>5432</spage><epage>5436</epage><pages>5432-5436</pages><issn>0169-4332</issn><eissn>1873-5584</eissn><abstract>The study of coating–substrate systems consisting of a thin copper film on a flat carbon substrate is of great interest in order to get information on the interfacial behaviour of such systems. 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°C for 1
h, considerably decreased adhesion strengths have been observed, accompanied by increased values of the thermal contact resistance.</abstract><cop>Amsterdam</cop><pub>Elsevier B.V</pub><doi>10.1016/j.apsusc.2005.12.086</doi><tpages>5</tpages></addata></record> |
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subjects | Adhesion AFM Condensed matter: electronic structure, electrical, magnetic, and optical properties Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science rheology Exact sciences and technology Interface Photothermal measurements Physics PVD coating Surface topography Thermal transport properties |
title | Loss of adhesion strength of PVD Cu films on carbon substrates after heat treatment and correlated effects on the thermal interface properties |
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