Electrical properties of films grown on W and Mo substrates by titanium ion implantation in nitrogen atmosphere

Electrical properties of films grown on W and Mo substrates by titanium ion implantation in nitrogen atmosphere

Films consisting of alternating nitride and oxide layers differing in phase composition and structure are grown on polycrystalline tungsten and molybdenum substrates by ion implantation. The resistivity and thermoelectric power of the films are measured as functions of temperature, and the temperatu...

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Veröffentlicht in:Inorganic materials 2005-03, Vol.41 (3), p.243-246
Hauptverfasser: Ignatenko, P. I., Badekin, M. Yu
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container_title Inorganic materials
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creator Ignatenko, P. I.
Badekin, M. Yu
description Films consisting of alternating nitride and oxide layers differing in phase composition and structure are grown on polycrystalline tungsten and molybdenum substrates by ion implantation. The resistivity and thermoelectric power of the films are measured as functions of temperature, and the temperature coefficient of their resistance is determined. The phase composition and electrical properties of the films are shown to be governed by the nitrogen-ion dose delivered to the titanium target.
doi_str_mv 10.1007/s10789-005-0117-x
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fullrecord <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_29132354</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>19936954</sourcerecordid><originalsourceid>FETCH-LOGICAL-c259t-610840f97e84acdc81265c042eb7918f6becc271795bb125ccd89bbee603089c3</originalsourceid><addsrcrecordid>eNqFkUtLAzEUhYMoWKs_wF1W7kbvzTySLKXUB1TcKC5DJs3UyMxkTDLY_nunrXtXlwMfh3P5CLlGuEUAfhcRuJAZQJkBIs-2J2SGFYgsR85OyQyAQYaVKM_JRYxfAFCUQs6IX7bWpOCMbukQ_GBDcjZS39DGtV2km-B_eup7-kF1v6YvnsaxjinoNFH1jiaXdO_GjrqJcd3Q6j7pdAg97V0KfmN7qlPn4_Bpg70kZ41uo736u3Py_rB8Wzxlq9fH58X9KjOslCmrEEQBjeRWFNqsjUBWlQYKZmsuUTRVbY1hHLks6xpZacxayLq2toIchDT5nNwce6envkcbk-pcNLad9lk_RsUk5iwvi39BlDKv5AHEI2iCjzHYRg3BdTrsFILaO1BHB2pyoPYO1Db_BfcofDQ</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>19936954</pqid></control><display><type>article</type><title>Electrical properties of films grown on W and Mo substrates by titanium ion implantation in nitrogen atmosphere</title><source>Springer Nature - Complete Springer Journals</source><creator>Ignatenko, P. I. ; Badekin, M. Yu</creator><creatorcontrib>Ignatenko, P. I. ; Badekin, M. Yu</creatorcontrib><description>Films consisting of alternating nitride and oxide layers differing in phase composition and structure are grown on polycrystalline tungsten and molybdenum substrates by ion implantation. The resistivity and thermoelectric power of the films are measured as functions of temperature, and the temperature coefficient of their resistance is determined. The phase composition and electrical properties of the films are shown to be governed by the nitrogen-ion dose delivered to the titanium target.</description><identifier>ISSN: 0020-1685</identifier><identifier>EISSN: 1608-3172</identifier><identifier>DOI: 10.1007/s10789-005-0117-x</identifier><language>eng</language><ispartof>Inorganic materials, 2005-03, Vol.41 (3), p.243-246</ispartof><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><cites>FETCH-LOGICAL-c259t-610840f97e84acdc81265c042eb7918f6becc271795bb125ccd89bbee603089c3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,776,780,27901,27902</link.rule.ids></links><search><creatorcontrib>Ignatenko, P. I.</creatorcontrib><creatorcontrib>Badekin, M. Yu</creatorcontrib><title>Electrical properties of films grown on W and Mo substrates by titanium ion implantation in nitrogen atmosphere</title><title>Inorganic materials</title><description>Films consisting of alternating nitride and oxide layers differing in phase composition and structure are grown on polycrystalline tungsten and molybdenum substrates by ion implantation. The resistivity and thermoelectric power of the films are measured as functions of temperature, and the temperature coefficient of their resistance is determined. The phase composition and electrical properties of the films are shown to be governed by the nitrogen-ion dose delivered to the titanium target.</description><issn>0020-1685</issn><issn>1608-3172</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2005</creationdate><recordtype>article</recordtype><recordid>eNqFkUtLAzEUhYMoWKs_wF1W7kbvzTySLKXUB1TcKC5DJs3UyMxkTDLY_nunrXtXlwMfh3P5CLlGuEUAfhcRuJAZQJkBIs-2J2SGFYgsR85OyQyAQYaVKM_JRYxfAFCUQs6IX7bWpOCMbukQ_GBDcjZS39DGtV2km-B_eup7-kF1v6YvnsaxjinoNFH1jiaXdO_GjrqJcd3Q6j7pdAg97V0KfmN7qlPn4_Bpg70kZ41uo736u3Py_rB8Wzxlq9fH58X9KjOslCmrEEQBjeRWFNqsjUBWlQYKZmsuUTRVbY1hHLks6xpZacxayLq2toIchDT5nNwce6envkcbk-pcNLad9lk_RsUk5iwvi39BlDKv5AHEI2iCjzHYRg3BdTrsFILaO1BHB2pyoPYO1Db_BfcofDQ</recordid><startdate>20050301</startdate><enddate>20050301</enddate><creator>Ignatenko, P. I.</creator><creator>Badekin, M. Yu</creator><scope>AAYXX</scope><scope>CITATION</scope><scope>7QO</scope><scope>8FD</scope><scope>FR3</scope><scope>P64</scope><scope>7QQ</scope><scope>7SR</scope><scope>8BQ</scope><scope>JG9</scope></search><sort><creationdate>20050301</creationdate><title>Electrical properties of films grown on W and Mo substrates by titanium ion implantation in nitrogen atmosphere</title><author>Ignatenko, P. I. ; Badekin, M. Yu</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c259t-610840f97e84acdc81265c042eb7918f6becc271795bb125ccd89bbee603089c3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2005</creationdate><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Ignatenko, P. I.</creatorcontrib><creatorcontrib>Badekin, M. Yu</creatorcontrib><collection>CrossRef</collection><collection>Biotechnology Research Abstracts</collection><collection>Technology Research Database</collection><collection>Engineering Research Database</collection><collection>Biotechnology and BioEngineering Abstracts</collection><collection>Ceramic Abstracts</collection><collection>Engineered Materials Abstracts</collection><collection>METADEX</collection><collection>Materials Research Database</collection><jtitle>Inorganic materials</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Ignatenko, P. I.</au><au>Badekin, M. Yu</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Electrical properties of films grown on W and Mo substrates by titanium ion implantation in nitrogen atmosphere</atitle><jtitle>Inorganic materials</jtitle><date>2005-03-01</date><risdate>2005</risdate><volume>41</volume><issue>3</issue><spage>243</spage><epage>246</epage><pages>243-246</pages><issn>0020-1685</issn><eissn>1608-3172</eissn><abstract>Films consisting of alternating nitride and oxide layers differing in phase composition and structure are grown on polycrystalline tungsten and molybdenum substrates by ion implantation. The resistivity and thermoelectric power of the films are measured as functions of temperature, and the temperature coefficient of their resistance is determined. The phase composition and electrical properties of the films are shown to be governed by the nitrogen-ion dose delivered to the titanium target.</abstract><doi>10.1007/s10789-005-0117-x</doi><tpages>4</tpages></addata></record>
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title Electrical properties of films grown on W and Mo substrates by titanium ion implantation in nitrogen atmosphere
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-02T10%3A54%3A40IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Electrical%20properties%20of%20films%20grown%20on%20W%20and%20Mo%20substrates%20by%20titanium%20ion%20implantation%20in%20nitrogen%20atmosphere&rft.jtitle=Inorganic%20materials&rft.au=Ignatenko,%20P.%20I.&rft.date=2005-03-01&rft.volume=41&rft.issue=3&rft.spage=243&rft.epage=246&rft.pages=243-246&rft.issn=0020-1685&rft.eissn=1608-3172&rft_id=info:doi/10.1007/s10789-005-0117-x&rft_dat=%3Cproquest_cross%3E19936954%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=19936954&rft_id=info:pmid/&rfr_iscdi=true