Sub-diffraction optical beam lithography based on a center-non-zero depletion laser

Photoinhibition (PI) mechanisms have been introduced in nanofabrication which allows breaking the diffraction limit by large factors. Donut-shaped laser is usually selected as a depletion beam to reduce linewidth, but the parasitic process has made the results of the experiment less than expected. A...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Optics letters 2024-01, Vol.49 (1), p.109-112
Hauptverfasser: Su, Chenyi, Ding, Chenliang, Yang, Zhenyao, Cao, Chun, Qiu, Yiwei, Zhu, Dazhao, Kuang, Cuifang, Liu, Xu
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
container_end_page 112
container_issue 1
container_start_page 109
container_title Optics letters
container_volume 49
creator Su, Chenyi
Ding, Chenliang
Yang, Zhenyao
Cao, Chun
Qiu, Yiwei
Zhu, Dazhao
Kuang, Cuifang
Liu, Xu
description Photoinhibition (PI) mechanisms have been introduced in nanofabrication which allows breaking the diffraction limit by large factors. Donut-shaped laser is usually selected as a depletion beam to reduce linewidth, but the parasitic process has made the results of the experiment less than expected. As a result, the linewidth is difficult to achieve below 50 nm with 780 nm femtosecond and 532 nm continuous-wave lasers. Here, we propose a new, to the best of our knowledge, method based on a center-non-zero (CNZ) depletion laser to further reduce linewidth. By constructing a smaller zone of action under the condition of keeping the maximum depletion intensity constant, a minimum linewidth of 30 nm (λ / 26) was achieved. Two ways to construct CNZ spots were discussed and experimented, and the results show the advantages of our method to reduce the parasitic process to further improve the writing resolution.
doi_str_mv 10.1364/OL.504691
format Article
fullrecord <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_2905525380</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>2912036363</sourcerecordid><originalsourceid>FETCH-LOGICAL-c273t-68cf7d49fb3bb30a78e2e118e287b0720fc6583051919e4f73c2e88ae9bcde113</originalsourceid><addsrcrecordid>eNpd0D1PwzAQBmALgWgpDPwBFIkFBhc7tuN4RBVfUqQOhTmynQtNlcbBToby6zG0MKCT7pbnTqcXoUtK5pRl_G5ZzAXhmaJHaEoFU5hLxY_RlFCeYSVUOkFnIWwIIZlk7BRNWE4ZpxmfotVqNLhq6tprOzSuS1w_NFa3iQG9TdpmWLt3r_v1LjE6QJVEoRML3QAed67Dn-BdUkHfws92G5E_Rye1bgNcHOYMvT0-vC6ecbF8elncF9imkg04y20tK65qw4xhRMscUqA09lwaIlNS20zkjAiqqAJeS2ZTyHMNytgqQjZDN_u7vXcfI4Sh3DbBQtvqDtwYylQRIVLBchLp9T-6caPv4ndR0ZSwLFZUt3tlvQvBQ132vtlqvyspKb-TLpdFuU862qvDxdFsofqTv9GyLyEud48</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>2912036363</pqid></control><display><type>article</type><title>Sub-diffraction optical beam lithography based on a center-non-zero depletion laser</title><source>Optica Publishing Group Journals</source><creator>Su, Chenyi ; Ding, Chenliang ; Yang, Zhenyao ; Cao, Chun ; Qiu, Yiwei ; Zhu, Dazhao ; Kuang, Cuifang ; Liu, Xu</creator><creatorcontrib>Su, Chenyi ; Ding, Chenliang ; Yang, Zhenyao ; Cao, Chun ; Qiu, Yiwei ; Zhu, Dazhao ; Kuang, Cuifang ; Liu, Xu</creatorcontrib><description>Photoinhibition (PI) mechanisms have been introduced in nanofabrication which allows breaking the diffraction limit by large factors. Donut-shaped laser is usually selected as a depletion beam to reduce linewidth, but the parasitic process has made the results of the experiment less than expected. As a result, the linewidth is difficult to achieve below 50 nm with 780 nm femtosecond and 532 nm continuous-wave lasers. Here, we propose a new, to the best of our knowledge, method based on a center-non-zero (CNZ) depletion laser to further reduce linewidth. By constructing a smaller zone of action under the condition of keeping the maximum depletion intensity constant, a minimum linewidth of 30 nm (λ / 26) was achieved. Two ways to construct CNZ spots were discussed and experimented, and the results show the advantages of our method to reduce the parasitic process to further improve the writing resolution.</description><identifier>ISSN: 0146-9592</identifier><identifier>EISSN: 1539-4794</identifier><identifier>DOI: 10.1364/OL.504691</identifier><identifier>PMID: 38134164</identifier><language>eng</language><publisher>United States: Optical Society of America</publisher><subject>Continuous wave lasers ; Depletion ; Diffraction ; Nanofabrication</subject><ispartof>Optics letters, 2024-01, Vol.49 (1), p.109-112</ispartof><rights>Copyright Optical Society of America Jan 1, 2024</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><cites>FETCH-LOGICAL-c273t-68cf7d49fb3bb30a78e2e118e287b0720fc6583051919e4f73c2e88ae9bcde113</cites><orcidid>0000-0001-8671-8408</orcidid></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,776,780,3245,27901,27902</link.rule.ids><backlink>$$Uhttps://www.ncbi.nlm.nih.gov/pubmed/38134164$$D View this record in MEDLINE/PubMed$$Hfree_for_read</backlink></links><search><creatorcontrib>Su, Chenyi</creatorcontrib><creatorcontrib>Ding, Chenliang</creatorcontrib><creatorcontrib>Yang, Zhenyao</creatorcontrib><creatorcontrib>Cao, Chun</creatorcontrib><creatorcontrib>Qiu, Yiwei</creatorcontrib><creatorcontrib>Zhu, Dazhao</creatorcontrib><creatorcontrib>Kuang, Cuifang</creatorcontrib><creatorcontrib>Liu, Xu</creatorcontrib><title>Sub-diffraction optical beam lithography based on a center-non-zero depletion laser</title><title>Optics letters</title><addtitle>Opt Lett</addtitle><description>Photoinhibition (PI) mechanisms have been introduced in nanofabrication which allows breaking the diffraction limit by large factors. Donut-shaped laser is usually selected as a depletion beam to reduce linewidth, but the parasitic process has made the results of the experiment less than expected. As a result, the linewidth is difficult to achieve below 50 nm with 780 nm femtosecond and 532 nm continuous-wave lasers. Here, we propose a new, to the best of our knowledge, method based on a center-non-zero (CNZ) depletion laser to further reduce linewidth. By constructing a smaller zone of action under the condition of keeping the maximum depletion intensity constant, a minimum linewidth of 30 nm (λ / 26) was achieved. Two ways to construct CNZ spots were discussed and experimented, and the results show the advantages of our method to reduce the parasitic process to further improve the writing resolution.</description><subject>Continuous wave lasers</subject><subject>Depletion</subject><subject>Diffraction</subject><subject>Nanofabrication</subject><issn>0146-9592</issn><issn>1539-4794</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2024</creationdate><recordtype>article</recordtype><recordid>eNpd0D1PwzAQBmALgWgpDPwBFIkFBhc7tuN4RBVfUqQOhTmynQtNlcbBToby6zG0MKCT7pbnTqcXoUtK5pRl_G5ZzAXhmaJHaEoFU5hLxY_RlFCeYSVUOkFnIWwIIZlk7BRNWE4ZpxmfotVqNLhq6tprOzSuS1w_NFa3iQG9TdpmWLt3r_v1LjE6QJVEoRML3QAed67Dn-BdUkHfws92G5E_Rye1bgNcHOYMvT0-vC6ecbF8elncF9imkg04y20tK65qw4xhRMscUqA09lwaIlNS20zkjAiqqAJeS2ZTyHMNytgqQjZDN_u7vXcfI4Sh3DbBQtvqDtwYylQRIVLBchLp9T-6caPv4ndR0ZSwLFZUt3tlvQvBQ132vtlqvyspKb-TLpdFuU862qvDxdFsofqTv9GyLyEud48</recordid><startdate>20240101</startdate><enddate>20240101</enddate><creator>Su, Chenyi</creator><creator>Ding, Chenliang</creator><creator>Yang, Zhenyao</creator><creator>Cao, Chun</creator><creator>Qiu, Yiwei</creator><creator>Zhu, Dazhao</creator><creator>Kuang, Cuifang</creator><creator>Liu, Xu</creator><general>Optical Society of America</general><scope>NPM</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>7U5</scope><scope>8FD</scope><scope>H8D</scope><scope>L7M</scope><scope>7X8</scope><orcidid>https://orcid.org/0000-0001-8671-8408</orcidid></search><sort><creationdate>20240101</creationdate><title>Sub-diffraction optical beam lithography based on a center-non-zero depletion laser</title><author>Su, Chenyi ; Ding, Chenliang ; Yang, Zhenyao ; Cao, Chun ; Qiu, Yiwei ; Zhu, Dazhao ; Kuang, Cuifang ; Liu, Xu</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c273t-68cf7d49fb3bb30a78e2e118e287b0720fc6583051919e4f73c2e88ae9bcde113</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2024</creationdate><topic>Continuous wave lasers</topic><topic>Depletion</topic><topic>Diffraction</topic><topic>Nanofabrication</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Su, Chenyi</creatorcontrib><creatorcontrib>Ding, Chenliang</creatorcontrib><creatorcontrib>Yang, Zhenyao</creatorcontrib><creatorcontrib>Cao, Chun</creatorcontrib><creatorcontrib>Qiu, Yiwei</creatorcontrib><creatorcontrib>Zhu, Dazhao</creatorcontrib><creatorcontrib>Kuang, Cuifang</creatorcontrib><creatorcontrib>Liu, Xu</creatorcontrib><collection>PubMed</collection><collection>CrossRef</collection><collection>Electronics &amp; Communications Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Aerospace Database</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>MEDLINE - Academic</collection><jtitle>Optics letters</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Su, Chenyi</au><au>Ding, Chenliang</au><au>Yang, Zhenyao</au><au>Cao, Chun</au><au>Qiu, Yiwei</au><au>Zhu, Dazhao</au><au>Kuang, Cuifang</au><au>Liu, Xu</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Sub-diffraction optical beam lithography based on a center-non-zero depletion laser</atitle><jtitle>Optics letters</jtitle><addtitle>Opt Lett</addtitle><date>2024-01-01</date><risdate>2024</risdate><volume>49</volume><issue>1</issue><spage>109</spage><epage>112</epage><pages>109-112</pages><issn>0146-9592</issn><eissn>1539-4794</eissn><abstract>Photoinhibition (PI) mechanisms have been introduced in nanofabrication which allows breaking the diffraction limit by large factors. Donut-shaped laser is usually selected as a depletion beam to reduce linewidth, but the parasitic process has made the results of the experiment less than expected. As a result, the linewidth is difficult to achieve below 50 nm with 780 nm femtosecond and 532 nm continuous-wave lasers. Here, we propose a new, to the best of our knowledge, method based on a center-non-zero (CNZ) depletion laser to further reduce linewidth. By constructing a smaller zone of action under the condition of keeping the maximum depletion intensity constant, a minimum linewidth of 30 nm (λ / 26) was achieved. Two ways to construct CNZ spots were discussed and experimented, and the results show the advantages of our method to reduce the parasitic process to further improve the writing resolution.</abstract><cop>United States</cop><pub>Optical Society of America</pub><pmid>38134164</pmid><doi>10.1364/OL.504691</doi><tpages>4</tpages><orcidid>https://orcid.org/0000-0001-8671-8408</orcidid></addata></record>
fulltext fulltext
identifier ISSN: 0146-9592
ispartof Optics letters, 2024-01, Vol.49 (1), p.109-112
issn 0146-9592
1539-4794
language eng
recordid cdi_proquest_miscellaneous_2905525380
source Optica Publishing Group Journals
subjects Continuous wave lasers
Depletion
Diffraction
Nanofabrication
title Sub-diffraction optical beam lithography based on a center-non-zero depletion laser
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2025-02-08T23%3A21%3A14IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Sub-diffraction%20optical%20beam%20lithography%20based%20on%20a%20center-non-zero%20depletion%20laser&rft.jtitle=Optics%20letters&rft.au=Su,%20Chenyi&rft.date=2024-01-01&rft.volume=49&rft.issue=1&rft.spage=109&rft.epage=112&rft.pages=109-112&rft.issn=0146-9592&rft.eissn=1539-4794&rft_id=info:doi/10.1364/OL.504691&rft_dat=%3Cproquest_cross%3E2912036363%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=2912036363&rft_id=info:pmid/38134164&rfr_iscdi=true