Aerosol Deposition of Ceramic Thick Films at Room Temperature: Densification Mechanism of Ceramic Layers

A novel method for depositing ceramic thick films by aerosol deposition (AD) is presented. Submicron ceramics particles are accelerated by gas flow up to 100–500 m/s and then impacted on a substrate, to form a dense, uniform and hard ceramic layer at room temperature. However, actual deposition mech...

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Veröffentlicht in:Journal of the American Ceramic Society 2006-06, Vol.89 (6), p.1834-1839
1. Verfasser: Akedo, Jun
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description A novel method for depositing ceramic thick films by aerosol deposition (AD) is presented. Submicron ceramics particles are accelerated by gas flow up to 100–500 m/s and then impacted on a substrate, to form a dense, uniform and hard ceramic layer at room temperature. However, actual deposition mechanism has not been clarified yet. To clarify densification mechanism during AD, a mixed aerosol of α‐Al2O3 and Pb(Zr, Ti)O3 powder was deposited to form a composite layer in this study. The cross‐section of the layer was observed by HR‐TEM to investigate the densification and bonding mechanism of ceramic particles. As a result, a plastic deformation of starting ceramic particles at room temperature was observed.
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source Wiley Online Library Journals Frontfile Complete
subjects Aerosols
Applied sciences
Building materials. Ceramics. Glasses
Ceramic industries
Ceramics
Chemical industry and chemicals
Cross sections
Densification
Deposition
Exact sciences and technology
Miscellaneous
Nanoparticles
Particulate composites
Tables
Technical ceramics
Temperature
Thick films
title Aerosol Deposition of Ceramic Thick Films at Room Temperature: Densification Mechanism of Ceramic Layers
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