Preparation of boron carbon nitride thin films by radio frequency magnetron sputtering

Boron carbon nitride films were deposited by radio frequency magnetron sputtering using a composite target consisting of h-BN and graphite in an Ar–N 2 gas mixture. The samples were characterized by X-ray diffraction, Fourier transform infrared spectroscopy and X-ray photoelectron spectroscopy. The...

Ausführliche Beschreibung

Bibliographische Detailangaben

Veröffentlicht in:	Applied surface science 2006-04, Vol.252 (12), p.4185-4189
Hauptverfasser:	Liu, Lihua, Wang, Yuxin, Feng, Kecheng, Li, Yingai, Li, Weiqing, Zhao, Chunhong, Zhao, Yongnian
Format:	Artikel
Sprache:	eng
Schlagworte:	Boron carbon nitride thin films Cross-disciplinary physics: materials science rheology Deposition by sputtering Exact sciences and technology Materials science Methods of deposition of films and coatings film growth and epitaxy Physics Radio frequency magnetron sputtering
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!