The improvement of optical reactivity for TiO2 thin films by N2-H2 plasma surface-treatment

To improve the optical reactivity of TiO2 thin film in visible-light region, sputter-deposited anatase film on slide glass substrate with 1200 A film thickness was surface-treated by N2-H2 mixed gases plasma and additionally anneal-treated in N2 gases at 400 deg C for 2 h. The absorption edges of pl...

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Veröffentlicht in:	Journal of crystal growth 2004-01, Vol.260 (1-2), p.118-124
Hauptverfasser:	LEI MIAO, TANEMURA, Sakae, WATANABE, Hiroshige, MORI, Yukimasa, KANEKO, Kenji, TOH, Shoichi
Format:	Artikel
Sprache:	eng
Schlagworte:	Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science rheology Defects and impurities: doping, implantation, distribution, concentration, etc Deposition by sputtering Exact sciences and technology Materials science Methods of deposition of films and coatings film growth and epitaxy Physics Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) Thin film structure and morphology
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