UV-Induced Synthesis of Hybrid HMDSO/SiO2 Thin Films with Compositional Gradients for High-Performance Atomic Oxygen Resistance

A flexible, dense, defect-free, highly adhesive, and highly dissociation energy-rich protective coating is essential to enhance the atomic oxygen (AO) resistance of polymeric materials in a low Earth orbit (LEO). In this work, a dense, defect-free hybrid HMDSO/SiO2 thin film coating with composition...

Ausführliche Beschreibung

Bibliographische Detailangaben

Veröffentlicht in:	ACS applied materials & interfaces 2023-10, Vol.15 (41), p.48810-48817
Hauptverfasser:	Li, Yi, Li, Zhonghua, He, Yanchun, Wang, Hu, Zhang, Kaifeng, Yuan, Lu, Cao, Shengzhu, Ma, Dongfeng, Li, Lin, Yang, Miao, Gao, Hengjiao, Wang, Kai, Xu, Min, Li, Detian
Format:	Artikel
Sprache:	eng
Schlagworte:	Surfaces, Interfaces, and Applications
Online-Zugang:	Volltext
Tags:	Tag hinzufügen Keine Tags, Fügen Sie den ersten Tag hinzu!