Improved step and flash imprint lithography templates for nanofabrication

Step and flash imprint lithography (SFIL) is an attractive method for printing sub-100 nm geometries. Relative to other imprinting processes, SFIL has the advantage that the template is transparent, thereby facilitating conventional overlay techniques. In addition, the imprint process is performed a...

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Bibliographische Detailangaben

Veröffentlicht in:	Microelectronic engineering 2003-09, Vol.69 (2), p.412-419
Hauptverfasser:	Resnick, D.J., Mancini, D., Dauksher, W.J., Nordquist, K., Bailey, T.C., Johnson, S., Sreenivasan, S.V., Ekerdt, J.G., Willson, C.G.
Format:	Artikel
Sprache:	eng
Schlagworte:	Flash Imprint Lithography Step
Online-Zugang:	Volltext
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