Photocatalytic TiO2 films deposited by reactive magnetron sputtering with unipolar pulsing and plasma emission control systems

TiO2 films with thickness of about 500 nm were deposited on unheated non-alkali glass substrates by reactive magnetron sputtering using one Ti metal target with unipolar pulsed powering of 50 kHz and the plasma emission feedback system (PCU). In order to keep the very high deposition rate, the depos...

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Veröffentlicht in:	Thin solid films 2006-02, Vol.496 (1), p.126-130
Hauptverfasser:	OHNO, S, TAKASAWA, N, SATO, Y, YOSHIKAWA, M, SUZUKI, K, FRACH, P, SHIGESATO, Y
Format:	Artikel
Sprache:	eng
Schlagworte:	Cross-disciplinary physics: materials science rheology Deposition by sputtering Exact sciences and technology Materials science Methods of deposition of films and coatings film growth and epitaxy Physics
Online-Zugang:	Volltext
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