Formation technique for macroporous morphology superlattice

Formation technique for macroporous morphology superlattice

In this work, the investigators studied etching conditions for generating macro porous silicon with different morphologies in p‐type (111) substrates. Both crystal orientation dependent growth of macropores and electric current direction dependent growth of macropores have been achieved. A superlatt...

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Veröffentlicht in:Physica status solidi. A, Applications and materials science Applications and materials science, 2005-06, Vol.202 (8), p.1662-1667
Hauptverfasser: Zheng, J., Christophersen, M., Bergstrom, P. L.
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68.37.Hk
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container_issue 8
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container_title Physica status solidi. A, Applications and materials science
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creator Zheng, J.
Christophersen, M.
Bergstrom, P. L.
description In this work, the investigators studied etching conditions for generating macro porous silicon with different morphologies in p‐type (111) substrates. Both crystal orientation dependent growth of macropores and electric current direction dependent growth of macropores have been achieved. A superlattice structure, which consists of several layers of macroporous silicon with different morphologies, has been demonstrated by modulating the etch conditions during the anodization process. The morphology superlattice structure is developed for an inlet particle filter of a micro gas chromatograph (µGC). It may offer a number of other new MEMS applications. (© 2005 WILEY‐VCH Verlag GmbH & Co. KGaA, Weinheim)
doi_str_mv 10.1002/pssa.200461214
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fullrecord <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_28694928</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>28694928</sourcerecordid><originalsourceid>FETCH-LOGICAL-c4194-fc6c107b25f37b5dc9346e336e402b94d56c17c62f62f9076ee9170fa5b1edf03</originalsourceid><addsrcrecordid>eNqNkM1LwzAYxoMoOKdXz73orTNfTRo8jeHmx1BhE72FNEtctW1q0qH77-3omN4UAgm8v-d5nzwAnCI4QBDiizoENcAQUoYwonugh1KGY0aQ2N-9ITwERyG8tVRCOeqBy7HzpWpyV0WN0csq_1iZyDoflUp7VzvvViEqna-XrnCv6yisauML1TS5NsfgwKoimJPt3QdP46v56DqePkxuRsNprCkSNLaaaQR5hhNLeJYstCCUGUKYoRBngi6Sds41w7Y9AnJmjEAcWpVkyCwsJH1w3vnW3rXxQiPLPGhTFKoybTyJUyaowOk_wATylG0cBx3Y_jEEb6ysfV4qv5YIyk2ZclOm3JXZCs62zipoVVivKp2HHxVLU4QIaTnRcZ95YdZ_uMrH2Wz4e0fcafPQmK-dVvl3yTjhiXy-n0hIXzCa395JQr4BtLGVLQ</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>28507860</pqid></control><display><type>article</type><title>Formation technique for macroporous morphology superlattice</title><source>Access via Wiley Online Library</source><creator>Zheng, J. ; Christophersen, M. ; Bergstrom, P. L.</creator><creatorcontrib>Zheng, J. ; Christophersen, M. ; Bergstrom, P. L.</creatorcontrib><description>In this work, the investigators studied etching conditions for generating macro porous silicon with different morphologies in p‐type (111) substrates. Both crystal orientation dependent growth of macropores and electric current direction dependent growth of macropores have been achieved. A superlattice structure, which consists of several layers of macroporous silicon with different morphologies, has been demonstrated by modulating the etch conditions during the anodization process. The morphology superlattice structure is developed for an inlet particle filter of a micro gas chromatograph (µGC). It may offer a number of other new MEMS applications. (© 2005 WILEY‐VCH Verlag GmbH &amp; Co. KGaA, Weinheim)</description><identifier>ISSN: 1862-6300</identifier><identifier>ISSN: 0031-8965</identifier><identifier>EISSN: 1862-6319</identifier><identifier>EISSN: 1521-396X</identifier><identifier>DOI: 10.1002/pssa.200461214</identifier><identifier>CODEN: PSSABA</identifier><language>eng</language><publisher>Berlin: WILEY-VCH Verlag</publisher><subject>68.37.Hk ; 81.07.Bc ; 82.45.Vp ; 85.85.+j ; Exact sciences and technology ; Physics</subject><ispartof>Physica status solidi. A, Applications and materials science, 2005-06, Vol.202 (8), p.1662-1667</ispartof><rights>Copyright © 2005 WILEY‐VCH Verlag GmbH &amp; Co. KGaA, Weinheim</rights><rights>2005 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c4194-fc6c107b25f37b5dc9346e336e402b94d56c17c62f62f9076ee9170fa5b1edf03</citedby><cites>FETCH-LOGICAL-c4194-fc6c107b25f37b5dc9346e336e402b94d56c17c62f62f9076ee9170fa5b1edf03</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktopdf>$$Uhttps://onlinelibrary.wiley.com/doi/pdf/10.1002%2Fpssa.200461214$$EPDF$$P50$$Gwiley$$H</linktopdf><linktohtml>$$Uhttps://onlinelibrary.wiley.com/doi/full/10.1002%2Fpssa.200461214$$EHTML$$P50$$Gwiley$$H</linktohtml><link.rule.ids>309,310,314,780,784,789,790,1417,23930,23931,25140,27924,27925,45574,45575</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&amp;idt=16881133$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Zheng, J.</creatorcontrib><creatorcontrib>Christophersen, M.</creatorcontrib><creatorcontrib>Bergstrom, P. L.</creatorcontrib><title>Formation technique for macroporous morphology superlattice</title><title>Physica status solidi. A, Applications and materials science</title><addtitle>phys. stat. sol. (a)</addtitle><description>In this work, the investigators studied etching conditions for generating macro porous silicon with different morphologies in p‐type (111) substrates. Both crystal orientation dependent growth of macropores and electric current direction dependent growth of macropores have been achieved. A superlattice structure, which consists of several layers of macroporous silicon with different morphologies, has been demonstrated by modulating the etch conditions during the anodization process. The morphology superlattice structure is developed for an inlet particle filter of a micro gas chromatograph (µGC). It may offer a number of other new MEMS applications. (© 2005 WILEY‐VCH Verlag GmbH &amp; Co. KGaA, Weinheim)</description><subject>68.37.Hk</subject><subject>81.07.Bc</subject><subject>82.45.Vp</subject><subject>85.85.+j</subject><subject>Exact sciences and technology</subject><subject>Physics</subject><issn>1862-6300</issn><issn>0031-8965</issn><issn>1862-6319</issn><issn>1521-396X</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2005</creationdate><recordtype>article</recordtype><recordid>eNqNkM1LwzAYxoMoOKdXz73orTNfTRo8jeHmx1BhE72FNEtctW1q0qH77-3omN4UAgm8v-d5nzwAnCI4QBDiizoENcAQUoYwonugh1KGY0aQ2N-9ITwERyG8tVRCOeqBy7HzpWpyV0WN0csq_1iZyDoflUp7VzvvViEqna-XrnCv6yisauML1TS5NsfgwKoimJPt3QdP46v56DqePkxuRsNprCkSNLaaaQR5hhNLeJYstCCUGUKYoRBngi6Sds41w7Y9AnJmjEAcWpVkyCwsJH1w3vnW3rXxQiPLPGhTFKoybTyJUyaowOk_wATylG0cBx3Y_jEEb6ysfV4qv5YIyk2ZclOm3JXZCs62zipoVVivKp2HHxVLU4QIaTnRcZ95YdZ_uMrH2Wz4e0fcafPQmK-dVvl3yTjhiXy-n0hIXzCa395JQr4BtLGVLQ</recordid><startdate>200506</startdate><enddate>200506</enddate><creator>Zheng, J.</creator><creator>Christophersen, M.</creator><creator>Bergstrom, P. L.</creator><general>WILEY-VCH Verlag</general><general>WILEY‐VCH Verlag</general><general>Wiley-VCH</general><scope>BSCLL</scope><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>8FD</scope><scope>H8D</scope><scope>L7M</scope><scope>7U5</scope></search><sort><creationdate>200506</creationdate><title>Formation technique for macroporous morphology superlattice</title><author>Zheng, J. ; Christophersen, M. ; Bergstrom, P. L.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c4194-fc6c107b25f37b5dc9346e336e402b94d56c17c62f62f9076ee9170fa5b1edf03</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2005</creationdate><topic>68.37.Hk</topic><topic>81.07.Bc</topic><topic>82.45.Vp</topic><topic>85.85.+j</topic><topic>Exact sciences and technology</topic><topic>Physics</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Zheng, J.</creatorcontrib><creatorcontrib>Christophersen, M.</creatorcontrib><creatorcontrib>Bergstrom, P. L.</creatorcontrib><collection>Istex</collection><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Technology Research Database</collection><collection>Aerospace Database</collection><collection>Advanced Technologies Database with Aerospace</collection><collection>Solid State and Superconductivity Abstracts</collection><jtitle>Physica status solidi. A, Applications and materials science</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Zheng, J.</au><au>Christophersen, M.</au><au>Bergstrom, P. L.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Formation technique for macroporous morphology superlattice</atitle><jtitle>Physica status solidi. A, Applications and materials science</jtitle><addtitle>phys. stat. sol. (a)</addtitle><date>2005-06</date><risdate>2005</risdate><volume>202</volume><issue>8</issue><spage>1662</spage><epage>1667</epage><pages>1662-1667</pages><issn>1862-6300</issn><issn>0031-8965</issn><eissn>1862-6319</eissn><eissn>1521-396X</eissn><coden>PSSABA</coden><abstract>In this work, the investigators studied etching conditions for generating macro porous silicon with different morphologies in p‐type (111) substrates. Both crystal orientation dependent growth of macropores and electric current direction dependent growth of macropores have been achieved. A superlattice structure, which consists of several layers of macroporous silicon with different morphologies, has been demonstrated by modulating the etch conditions during the anodization process. The morphology superlattice structure is developed for an inlet particle filter of a micro gas chromatograph (µGC). It may offer a number of other new MEMS applications. (© 2005 WILEY‐VCH Verlag GmbH &amp; Co. KGaA, Weinheim)</abstract><cop>Berlin</cop><pub>WILEY-VCH Verlag</pub><doi>10.1002/pssa.200461214</doi><tpages>6</tpages></addata></record>
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subjects 68.37.Hk
81.07.Bc
82.45.Vp
85.85.+j
Exact sciences and technology
Physics
title Formation technique for macroporous morphology superlattice
url https://sfx.bib-bvb.de/sfx_tum?ctx_ver=Z39.88-2004&ctx_enc=info:ofi/enc:UTF-8&ctx_tim=2024-12-21T11%3A51%3A39IST&url_ver=Z39.88-2004&url_ctx_fmt=infofi/fmt:kev:mtx:ctx&rfr_id=info:sid/primo.exlibrisgroup.com:primo3-Article-proquest_cross&rft_val_fmt=info:ofi/fmt:kev:mtx:journal&rft.genre=article&rft.atitle=Formation%20technique%20for%20macroporous%20morphology%20superlattice&rft.jtitle=Physica%20status%20solidi.%20A,%20Applications%20and%20materials%20science&rft.au=Zheng,%20J.&rft.date=2005-06&rft.volume=202&rft.issue=8&rft.spage=1662&rft.epage=1667&rft.pages=1662-1667&rft.issn=1862-6300&rft.eissn=1862-6319&rft.coden=PSSABA&rft_id=info:doi/10.1002/pssa.200461214&rft_dat=%3Cproquest_cross%3E28694928%3C/proquest_cross%3E%3Curl%3E%3C/url%3E&disable_directlink=true&sfx.directlink=off&sfx.report_link=0&rft_id=info:oai/&rft_pqid=28507860&rft_id=info:pmid/&rfr_iscdi=true