Top layer's thickness dependence on total electron-yield X-ray standing-wave

Top layer's thickness dependence on total electron-yield X-ray standing-wave

A Mo single-layer film with a stepwise thickness distribution was fabricated on the same Mo/Si reflection multilayer film. Total electron-yield X-ray standing-wave (TEY-XSW) spectra of the aperiodic multilayer were measured with reflection spectra. The peak positions of the standing waves in the TEY...

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Veröffentlicht in:Journal of electron spectroscopy and related phenomena 2005-06, Vol.144 (Complete), p.897-899
Hauptverfasser: Ejima, Takeo, Yamazaki, Atsushi, Banse, Takanori, Hatano, Tadashi
Format: Artikel
Sprache:eng
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Multilayer
Standing wave
TEY-XSW
Thickness
Total electron yield
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container_issue Complete
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container_title Journal of electron spectroscopy and related phenomena
container_volume 144
creator Ejima, Takeo
Yamazaki, Atsushi
Banse, Takanori
Hatano, Tadashi
description A Mo single-layer film with a stepwise thickness distribution was fabricated on the same Mo/Si reflection multilayer film. Total electron-yield X-ray standing-wave (TEY-XSW) spectra of the aperiodic multilayer were measured with reflection spectra. The peak positions of the standing waves in the TEY-XSW spectra changed as the film thickness of the top Mo-layer increased.
doi_str_mv 10.1016/j.elspec.2005.01.085
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subjects Multilayer
Standing wave
TEY-XSW
Thickness
Total electron yield
title Top layer's thickness dependence on total electron-yield X-ray standing-wave
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