Balance between the diffraction efficiency and process robustness for plasmonic lithographic alignment technology considering the Fabry–Perot resonator effect

Different from traditional lithography, metal material with high absorptivity and high reflectivity is introduced into plasmonic lithography technology. In particular, a silver/photo resist/silver film stack can form a Fabry–Perot (F-P) resonator structure, which can greatly change the behavior of t...

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