Study of the defects induced in N-type silicon irradiated by 1-3 MeV protons

The electrical properties of semiconductor components can be greatly modified by proton implantation. Spreading resistance, C-V (capacitance voltage) and DLTS (deep levels transient spectroscopy) measurements have been used to characterize N-type silicon irradiated by MeV proton at fluences up to 10...

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Veröffentlicht in:IEEE Transactions on Nuclear Science (Institute of Electrical and Electronics Engineers); (United States) 1994-12, Vol.41 (6), p.1932-1936
Hauptverfasser: Ntsoenzok, E., Barbot, J.F., Desgardin, P., Vernois, J., Blanchard, C., Isabelle, D.B.
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Sprache:eng
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Zusammenfassung:The electrical properties of semiconductor components can be greatly modified by proton implantation. Spreading resistance, C-V (capacitance voltage) and DLTS (deep levels transient spectroscopy) measurements have been used to characterize N-type silicon irradiated by MeV proton at fluences up to 10/sup 14/p/sup +/cm/sup -2/. The greatest drawback induced by proton implantation is the overdoping effect which can strongly reduce device efficiency. The present work reports this effect in both annealed and unannealed samples.< >
ISSN:0018-9499
1558-1578
DOI:10.1109/23.340526