Plasma enhanced CVD deposition of titanium oxide for biomedical applications
Radio frequency plasma enhanced chemical vapor deposition (RF PECVD) of titanium oxide films for bactericidal applications is reported. Titanium tetrachloride was used as a precursor compound, and the depositions were performed in the presence of oxygen. The films were deposited on glass and cotton...
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Veröffentlicht in: | Surface & coatings technology 2005-10, Vol.200 (1-4), p.1036-1040 |
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creator | Szymanowski, H. Sobczyk, A. Gazicki-Lipman, M. Jakubowski, W. Klimek, L. |
description | Radio frequency plasma enhanced chemical vapor deposition (RF PECVD) of titanium oxide films for bactericidal applications is reported. Titanium tetrachloride was used as a precursor compound, and the depositions were performed in the presence of oxygen. The films were deposited on glass and cotton textile substrates. Optical properties, and namely refractive index and extinction coefficient, of the films deposited on glass were used as criteria for their quality. Bactericidal properties were studied using cultures of K12 strain of Esterichia coli and the ultraviolet light C (UV-C) irradiation. An effect of an RF power of the discharge on both the optical and the bactericidal properties of the films was investigated. The results showed a substantial enhancement of the bactericidal activity of UV irradiation for the surfaces modified with the presented process. A strong correlation between the bactericidal efficiency of the films and their refractive index has been observed. The morphology and elemental composition of the coatings applied to cotton textile were also investigated using electron scanning microscopy (SEM) and energy dispersive X-ray (EDX) technique. |
doi_str_mv | 10.1016/j.surfcoat.2005.01.092 |
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Titanium tetrachloride was used as a precursor compound, and the depositions were performed in the presence of oxygen. The films were deposited on glass and cotton textile substrates. Optical properties, and namely refractive index and extinction coefficient, of the films deposited on glass were used as criteria for their quality. Bactericidal properties were studied using cultures of K12 strain of Esterichia coli and the ultraviolet light C (UV-C) irradiation. An effect of an RF power of the discharge on both the optical and the bactericidal properties of the films was investigated. The results showed a substantial enhancement of the bactericidal activity of UV irradiation for the surfaces modified with the presented process. A strong correlation between the bactericidal efficiency of the films and their refractive index has been observed. The morphology and elemental composition of the coatings applied to cotton textile were also investigated using electron scanning microscopy (SEM) and energy dispersive X-ray (EDX) technique.</description><identifier>ISSN: 0257-8972</identifier><identifier>EISSN: 1879-3347</identifier><identifier>DOI: 10.1016/j.surfcoat.2005.01.092</identifier><identifier>CODEN: SCTEEJ</identifier><language>eng</language><publisher>Lausanne: Elsevier B.V</publisher><subject>Applied sciences ; Cross-disciplinary physics: materials science; rheology ; Escherichia coli ; Exact sciences and technology ; Materials science ; Metals. Metallurgy ; Other topics in materials science ; PECVD ; Photocatalyst ; Physics ; Production techniques ; Surface treatment ; TiO2</subject><ispartof>Surface & coatings technology, 2005-10, Vol.200 (1-4), p.1036-1040</ispartof><rights>2005 Elsevier B.V.</rights><rights>2006 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c439t-fd18cdc9c12f14178ecb58868218cb5262e97f9bb4e7921bfd86c62075be36983</citedby><cites>FETCH-LOGICAL-c439t-fd18cdc9c12f14178ecb58868218cb5262e97f9bb4e7921bfd86c62075be36983</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><linktohtml>$$Uhttps://dx.doi.org/10.1016/j.surfcoat.2005.01.092$$EHTML$$P50$$Gelsevier$$H</linktohtml><link.rule.ids>310,311,315,781,785,790,791,3551,23935,23936,25145,27929,27930,46000</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=17448084$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>Szymanowski, H.</creatorcontrib><creatorcontrib>Sobczyk, A.</creatorcontrib><creatorcontrib>Gazicki-Lipman, M.</creatorcontrib><creatorcontrib>Jakubowski, W.</creatorcontrib><creatorcontrib>Klimek, L.</creatorcontrib><title>Plasma enhanced CVD deposition of titanium oxide for biomedical applications</title><title>Surface & coatings technology</title><description>Radio frequency plasma enhanced chemical vapor deposition (RF PECVD) of titanium oxide films for bactericidal applications is reported. Titanium tetrachloride was used as a precursor compound, and the depositions were performed in the presence of oxygen. The films were deposited on glass and cotton textile substrates. Optical properties, and namely refractive index and extinction coefficient, of the films deposited on glass were used as criteria for their quality. Bactericidal properties were studied using cultures of K12 strain of Esterichia coli and the ultraviolet light C (UV-C) irradiation. An effect of an RF power of the discharge on both the optical and the bactericidal properties of the films was investigated. The results showed a substantial enhancement of the bactericidal activity of UV irradiation for the surfaces modified with the presented process. A strong correlation between the bactericidal efficiency of the films and their refractive index has been observed. The morphology and elemental composition of the coatings applied to cotton textile were also investigated using electron scanning microscopy (SEM) and energy dispersive X-ray (EDX) technique.</description><subject>Applied sciences</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Escherichia coli</subject><subject>Exact sciences and technology</subject><subject>Materials science</subject><subject>Metals. Metallurgy</subject><subject>Other topics in materials science</subject><subject>PECVD</subject><subject>Photocatalyst</subject><subject>Physics</subject><subject>Production techniques</subject><subject>Surface treatment</subject><subject>TiO2</subject><issn>0257-8972</issn><issn>1879-3347</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2005</creationdate><recordtype>article</recordtype><recordid>eNqFkE1r3DAQhkVoodtt_kLRJb3ZkWRbH7eUbdoEFpJDkquQpRHRYluu5C3Jv6_MpvSY0wzDMzO8D0JfKakpofzyUOdj8jaapWaEdDWhNVHsDG2oFKpqmlZ8QBvCOlFJJdgn9DnnAyGECtVu0P5-MHk0GKZnM1lwePf0AzuYYw5LiBOOHi9hMVM4jji-BAfYx4T7EEdwwZoBm3keSrPC-Qv66M2Q4fytbtHjz-uH3U21v_t1u_u-r2zbqKXyjkrrrLKUedpSIcH2nZRcsjLvO8YZKOFV37cgFKO9d5Jbzojoemi4ks0WfTvdnVP8fYS86DFkC8NgJojHrJnkVHClCshPoE0x5wRezymMJr1qSvQqTx_0P3l6lacJ1UVeWbx4-2BySelTkRPy_23RtpLItnBXJw5K3D8Bks42wCoyJLCLdjG89-ovlrCJVg</recordid><startdate>20051001</startdate><enddate>20051001</enddate><creator>Szymanowski, H.</creator><creator>Sobczyk, A.</creator><creator>Gazicki-Lipman, M.</creator><creator>Jakubowski, W.</creator><creator>Klimek, L.</creator><general>Elsevier B.V</general><general>Elsevier</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7QQ</scope><scope>7SR</scope><scope>7TB</scope><scope>8FD</scope><scope>FR3</scope><scope>JG9</scope></search><sort><creationdate>20051001</creationdate><title>Plasma enhanced CVD deposition of titanium oxide for biomedical applications</title><author>Szymanowski, H. ; Sobczyk, A. ; Gazicki-Lipman, M. ; Jakubowski, W. ; Klimek, L.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c439t-fd18cdc9c12f14178ecb58868218cb5262e97f9bb4e7921bfd86c62075be36983</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2005</creationdate><topic>Applied sciences</topic><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>Escherichia coli</topic><topic>Exact sciences and technology</topic><topic>Materials science</topic><topic>Metals. Metallurgy</topic><topic>Other topics in materials science</topic><topic>PECVD</topic><topic>Photocatalyst</topic><topic>Physics</topic><topic>Production techniques</topic><topic>Surface treatment</topic><topic>TiO2</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>Szymanowski, H.</creatorcontrib><creatorcontrib>Sobczyk, A.</creatorcontrib><creatorcontrib>Gazicki-Lipman, M.</creatorcontrib><creatorcontrib>Jakubowski, W.</creatorcontrib><creatorcontrib>Klimek, L.</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Ceramic Abstracts</collection><collection>Engineered Materials Abstracts</collection><collection>Mechanical & Transportation Engineering Abstracts</collection><collection>Technology Research Database</collection><collection>Engineering Research Database</collection><collection>Materials Research Database</collection><jtitle>Surface & coatings technology</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>Szymanowski, H.</au><au>Sobczyk, A.</au><au>Gazicki-Lipman, M.</au><au>Jakubowski, W.</au><au>Klimek, L.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Plasma enhanced CVD deposition of titanium oxide for biomedical applications</atitle><jtitle>Surface & coatings technology</jtitle><date>2005-10-01</date><risdate>2005</risdate><volume>200</volume><issue>1-4</issue><spage>1036</spage><epage>1040</epage><pages>1036-1040</pages><issn>0257-8972</issn><eissn>1879-3347</eissn><coden>SCTEEJ</coden><abstract>Radio frequency plasma enhanced chemical vapor deposition (RF PECVD) of titanium oxide films for bactericidal applications is reported. Titanium tetrachloride was used as a precursor compound, and the depositions were performed in the presence of oxygen. The films were deposited on glass and cotton textile substrates. Optical properties, and namely refractive index and extinction coefficient, of the films deposited on glass were used as criteria for their quality. Bactericidal properties were studied using cultures of K12 strain of Esterichia coli and the ultraviolet light C (UV-C) irradiation. An effect of an RF power of the discharge on both the optical and the bactericidal properties of the films was investigated. The results showed a substantial enhancement of the bactericidal activity of UV irradiation for the surfaces modified with the presented process. A strong correlation between the bactericidal efficiency of the films and their refractive index has been observed. The morphology and elemental composition of the coatings applied to cotton textile were also investigated using electron scanning microscopy (SEM) and energy dispersive X-ray (EDX) technique.</abstract><cop>Lausanne</cop><pub>Elsevier B.V</pub><doi>10.1016/j.surfcoat.2005.01.092</doi><tpages>5</tpages></addata></record> |
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subjects | Applied sciences Cross-disciplinary physics: materials science rheology Escherichia coli Exact sciences and technology Materials science Metals. Metallurgy Other topics in materials science PECVD Photocatalyst Physics Production techniques Surface treatment TiO2 |
title | Plasma enhanced CVD deposition of titanium oxide for biomedical applications |
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