Influence of Ar ion-beam assistance and annealing temperatures on properties of TiO2 thin films deposited by reactive DC magnetron sputtering

TiO2 thin films were prepared by using a reactive DC magnetron sputtering method with Ar ion-beam assistance. The effect of the Ar ion-beam current on the structural and optical properties of the reactive magnetron sputtered TiO2 thin films was studied. The as-deposited films were subjected to annea...

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Veröffentlicht in:	Thin solid films 2005-03, Vol.475 (1-2), p.155-159
Hauptverfasser:	Kim, Sung-Hwa, Kwon Hwangbo, Chang
Format:	Artikel
Sprache:	eng
Schlagworte:	Ion-beam deposition Magnetron Reactive sputtering Titanium oxide
Online-Zugang:	Volltext
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