In-Line Copper Contamination Monitoring Using Noncontact Q-VSPV Techniques

A novel approach for the sensitive detection and unequivocal identification of trace amounts of copper introduced into p-type silicon and its oxide during high-temperature processing is discussed. Noncontact surface voltage and surface photovoltage (SPV) measurements are employed to determine the im...

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Veröffentlicht in:	Journal of the Electrochemical Society 2005, Vol.152 (1), p.G1-G6
Hauptverfasser:	Boehringer, Matthias, Hauber, Johann, Passefort, Sophie, Eason, Kwame
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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