Effects of oxygen pressure on lattice parameter, orientation, surface morphology and deposition rate of (Ba0.02Sr0.98)TiO3 thin films grown on MgO substrate by pulsed laser deposition
(Ba0*02Sr0*98)TiO3 thin films were grown on MgO substrate by pulsed laser deposition (PLD) techniques at various oxygen pressures from 40 to 10(--3)Pa. Effects of oxygen pressure on lattice parameter, orientation, surface morphology and deposition rate of the thin films were investigated. X--ray dif...
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creator | CAN WANG CHENG, B. L WANG, S. Y LU, H. B ZHOU, Y. L CHEN, Z. H YANG, G. Z |
description | (Ba0*02Sr0*98)TiO3 thin films were grown on MgO substrate by pulsed laser deposition (PLD) techniques at various oxygen pressures from 40 to 10(--3)Pa. Effects of oxygen pressure on lattice parameter, orientation, surface morphology and deposition rate of the thin films were investigated. X--ray diffraction patterns indicate that, with decreasing oxygen pressure, crystal orientation of the thin films develops from (110) preferred orientation to random orientation, and finally to perfectly (00l) texture. Meantime, lattice parameter of the thin films increases with decreasing oxygen pressure. Especially, perfectly (00l)--oriented (Ba0*02Sr0*98)TiO3 thin film was obtained under oxygen pressure of 10(--3)Pa at substrate temperature of 850 deg C, in spite of the large lattice mismatch of about 8% between (Ba0*02Sr0*98)TiO3 and MgO. Atomic force microscopy images show that all the thin films have granular structure and the thin film grown at 10(--3)Pa has much more homogeneous grain size distribution compared to all the other thin films. Moreover, the films grown at oxygen pressures of 1 and 10(--1)Pa have more smooth surfaces, and the deposition rate of thin film increases with decreasing oxygen pressure. re. |
doi_str_mv | 10.1016/j.tsf.2005.03.055 |
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fullrecord | <record><control><sourceid>proquest_cross</sourceid><recordid>TN_cdi_proquest_miscellaneous_28532365</recordid><sourceformat>XML</sourceformat><sourcesystem>PC</sourcesystem><sourcerecordid>28532365</sourcerecordid><originalsourceid>FETCH-LOGICAL-c236t-54966e9a94ebf16943b8957a5f4072f376ee08bee0a440975b0b8d9abe54bb4a3</originalsourceid><addsrcrecordid>eNpNkUFv1DAQhSMEEkvLD-DmCwikJh3HcRIfoSpQqWgPLWdrnB1vvUriYHsF-8v4ezi0ElxmDvPe90Z6RfGGQ8WBt5eHKkVb1QCyAlGBlM-KDe87Vdad4M-LDUADZQsKXhavYjwAAK9rsSl-X1tLQ4rMW-Z_nfY0syVQjMdAzM9sxJTcQGzBgBMlChfMB0dzwuT8fMGyzmK-Tz4sD370-xPDecd2tPjoVgkLmGiFv_-EUEF9F6BS_Yd7txUsPbiZWTdOke2D_zmvgd_22ww1Mf31mRNbjmOkXX4kUviPe168sJgvr5_2WfH98_X91dfydvvl5urjbTnUok2lbFTbkkLVkLG8VY0wvZIdSttAV1vRtUTQmzywaUB10oDpdwoNycaYBsVZ8e6RuwT_40gx6cnFgcYRZ_LHqOteipwks5A_CofgYwxk9RLchOGkOei1In3QuSK9VqRB6FxR9rx9gmMccLQB58HFf8ZWCaW6WvwBgdOVNw</addsrcrecordid><sourcetype>Aggregation Database</sourcetype><iscdi>true</iscdi><recordtype>article</recordtype><pqid>28532365</pqid></control><display><type>article</type><title>Effects of oxygen pressure on lattice parameter, orientation, surface morphology and deposition rate of (Ba0.02Sr0.98)TiO3 thin films grown on MgO substrate by pulsed laser deposition</title><source>Access via ScienceDirect (Elsevier)</source><creator>CAN WANG ; CHENG, B. L ; WANG, S. Y ; LU, H. B ; ZHOU, Y. L ; CHEN, Z. H ; YANG, G. Z</creator><creatorcontrib>CAN WANG ; CHENG, B. L ; WANG, S. Y ; LU, H. B ; ZHOU, Y. L ; CHEN, Z. H ; YANG, G. Z</creatorcontrib><description>(Ba0*02Sr0*98)TiO3 thin films were grown on MgO substrate by pulsed laser deposition (PLD) techniques at various oxygen pressures from 40 to 10(--3)Pa. Effects of oxygen pressure on lattice parameter, orientation, surface morphology and deposition rate of the thin films were investigated. X--ray diffraction patterns indicate that, with decreasing oxygen pressure, crystal orientation of the thin films develops from (110) preferred orientation to random orientation, and finally to perfectly (00l) texture. Meantime, lattice parameter of the thin films increases with decreasing oxygen pressure. Especially, perfectly (00l)--oriented (Ba0*02Sr0*98)TiO3 thin film was obtained under oxygen pressure of 10(--3)Pa at substrate temperature of 850 deg C, in spite of the large lattice mismatch of about 8% between (Ba0*02Sr0*98)TiO3 and MgO. Atomic force microscopy images show that all the thin films have granular structure and the thin film grown at 10(--3)Pa has much more homogeneous grain size distribution compared to all the other thin films. Moreover, the films grown at oxygen pressures of 1 and 10(--1)Pa have more smooth surfaces, and the deposition rate of thin film increases with decreasing oxygen pressure. re.</description><identifier>ISSN: 0040-6090</identifier><identifier>EISSN: 1879-2731</identifier><identifier>DOI: 10.1016/j.tsf.2005.03.055</identifier><identifier>CODEN: THSFAP</identifier><language>eng</language><publisher>Lausanne: Elsevier Science</publisher><subject>Condensed matter: electronic structure, electrical, magnetic, and optical properties ; Condensed matter: structure, mechanical and thermal properties ; Cross-disciplinary physics: materials science; rheology ; Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures ; Exact sciences and technology ; Materials science ; Methods of crystal growth; physics of crystal growth ; Methods of deposition of films and coatings; film growth and epitaxy ; Physics ; Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties) ; Theory and models of crystal growth; physics of crystal growth, crystal morphology and orientation ; Thin film structure and morphology</subject><ispartof>Thin solid films, 2005-08, Vol.485 (1-2), p.82-89</ispartof><rights>2006 INIST-CNRS</rights><lds50>peer_reviewed</lds50><woscitedreferencessubscribed>false</woscitedreferencessubscribed><citedby>FETCH-LOGICAL-c236t-54966e9a94ebf16943b8957a5f4072f376ee08bee0a440975b0b8d9abe54bb4a3</citedby><cites>FETCH-LOGICAL-c236t-54966e9a94ebf16943b8957a5f4072f376ee08bee0a440975b0b8d9abe54bb4a3</cites></display><links><openurl>$$Topenurl_article</openurl><openurlfulltext>$$Topenurlfull_article</openurlfulltext><thumbnail>$$Tsyndetics_thumb_exl</thumbnail><link.rule.ids>314,780,784,27924,27925</link.rule.ids><backlink>$$Uhttp://pascal-francis.inist.fr/vibad/index.php?action=getRecordDetail&idt=16939972$$DView record in Pascal Francis$$Hfree_for_read</backlink></links><search><creatorcontrib>CAN WANG</creatorcontrib><creatorcontrib>CHENG, B. L</creatorcontrib><creatorcontrib>WANG, S. Y</creatorcontrib><creatorcontrib>LU, H. B</creatorcontrib><creatorcontrib>ZHOU, Y. L</creatorcontrib><creatorcontrib>CHEN, Z. H</creatorcontrib><creatorcontrib>YANG, G. Z</creatorcontrib><title>Effects of oxygen pressure on lattice parameter, orientation, surface morphology and deposition rate of (Ba0.02Sr0.98)TiO3 thin films grown on MgO substrate by pulsed laser deposition</title><title>Thin solid films</title><description>(Ba0*02Sr0*98)TiO3 thin films were grown on MgO substrate by pulsed laser deposition (PLD) techniques at various oxygen pressures from 40 to 10(--3)Pa. Effects of oxygen pressure on lattice parameter, orientation, surface morphology and deposition rate of the thin films were investigated. X--ray diffraction patterns indicate that, with decreasing oxygen pressure, crystal orientation of the thin films develops from (110) preferred orientation to random orientation, and finally to perfectly (00l) texture. Meantime, lattice parameter of the thin films increases with decreasing oxygen pressure. Especially, perfectly (00l)--oriented (Ba0*02Sr0*98)TiO3 thin film was obtained under oxygen pressure of 10(--3)Pa at substrate temperature of 850 deg C, in spite of the large lattice mismatch of about 8% between (Ba0*02Sr0*98)TiO3 and MgO. Atomic force microscopy images show that all the thin films have granular structure and the thin film grown at 10(--3)Pa has much more homogeneous grain size distribution compared to all the other thin films. Moreover, the films grown at oxygen pressures of 1 and 10(--1)Pa have more smooth surfaces, and the deposition rate of thin film increases with decreasing oxygen pressure. re.</description><subject>Condensed matter: electronic structure, electrical, magnetic, and optical properties</subject><subject>Condensed matter: structure, mechanical and thermal properties</subject><subject>Cross-disciplinary physics: materials science; rheology</subject><subject>Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures</subject><subject>Exact sciences and technology</subject><subject>Materials science</subject><subject>Methods of crystal growth; physics of crystal growth</subject><subject>Methods of deposition of films and coatings; film growth and epitaxy</subject><subject>Physics</subject><subject>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</subject><subject>Theory and models of crystal growth; physics of crystal growth, crystal morphology and orientation</subject><subject>Thin film structure and morphology</subject><issn>0040-6090</issn><issn>1879-2731</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>2005</creationdate><recordtype>article</recordtype><recordid>eNpNkUFv1DAQhSMEEkvLD-DmCwikJh3HcRIfoSpQqWgPLWdrnB1vvUriYHsF-8v4ezi0ElxmDvPe90Z6RfGGQ8WBt5eHKkVb1QCyAlGBlM-KDe87Vdad4M-LDUADZQsKXhavYjwAAK9rsSl-X1tLQ4rMW-Z_nfY0syVQjMdAzM9sxJTcQGzBgBMlChfMB0dzwuT8fMGyzmK-Tz4sD370-xPDecd2tPjoVgkLmGiFv_-EUEF9F6BS_Yd7txUsPbiZWTdOke2D_zmvgd_22ww1Mf31mRNbjmOkXX4kUviPe168sJgvr5_2WfH98_X91dfydvvl5urjbTnUok2lbFTbkkLVkLG8VY0wvZIdSttAV1vRtUTQmzywaUB10oDpdwoNycaYBsVZ8e6RuwT_40gx6cnFgcYRZ_LHqOteipwks5A_CofgYwxk9RLchOGkOei1In3QuSK9VqRB6FxR9rx9gmMccLQB58HFf8ZWCaW6WvwBgdOVNw</recordid><startdate>20050801</startdate><enddate>20050801</enddate><creator>CAN WANG</creator><creator>CHENG, B. L</creator><creator>WANG, S. Y</creator><creator>LU, H. B</creator><creator>ZHOU, Y. L</creator><creator>CHEN, Z. H</creator><creator>YANG, G. Z</creator><general>Elsevier Science</general><scope>IQODW</scope><scope>AAYXX</scope><scope>CITATION</scope><scope>7QQ</scope><scope>7SP</scope><scope>7U5</scope><scope>8FD</scope><scope>JG9</scope><scope>L7M</scope></search><sort><creationdate>20050801</creationdate><title>Effects of oxygen pressure on lattice parameter, orientation, surface morphology and deposition rate of (Ba0.02Sr0.98)TiO3 thin films grown on MgO substrate by pulsed laser deposition</title><author>CAN WANG ; CHENG, B. L ; WANG, S. Y ; LU, H. B ; ZHOU, Y. L ; CHEN, Z. H ; YANG, G. Z</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c236t-54966e9a94ebf16943b8957a5f4072f376ee08bee0a440975b0b8d9abe54bb4a3</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>2005</creationdate><topic>Condensed matter: electronic structure, electrical, magnetic, and optical properties</topic><topic>Condensed matter: structure, mechanical and thermal properties</topic><topic>Cross-disciplinary physics: materials science; rheology</topic><topic>Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures</topic><topic>Exact sciences and technology</topic><topic>Materials science</topic><topic>Methods of crystal growth; physics of crystal growth</topic><topic>Methods of deposition of films and coatings; film growth and epitaxy</topic><topic>Physics</topic><topic>Surfaces and interfaces; thin films and whiskers (structure and nonelectronic properties)</topic><topic>Theory and models of crystal growth; physics of crystal growth, crystal morphology and orientation</topic><topic>Thin film structure and morphology</topic><toplevel>peer_reviewed</toplevel><toplevel>online_resources</toplevel><creatorcontrib>CAN WANG</creatorcontrib><creatorcontrib>CHENG, B. L</creatorcontrib><creatorcontrib>WANG, S. Y</creatorcontrib><creatorcontrib>LU, H. B</creatorcontrib><creatorcontrib>ZHOU, Y. L</creatorcontrib><creatorcontrib>CHEN, Z. H</creatorcontrib><creatorcontrib>YANG, G. Z</creatorcontrib><collection>Pascal-Francis</collection><collection>CrossRef</collection><collection>Ceramic Abstracts</collection><collection>Electronics & Communications Abstracts</collection><collection>Solid State and Superconductivity Abstracts</collection><collection>Technology Research Database</collection><collection>Materials Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>Thin solid films</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext</fulltext></delivery><addata><au>CAN WANG</au><au>CHENG, B. L</au><au>WANG, S. Y</au><au>LU, H. B</au><au>ZHOU, Y. L</au><au>CHEN, Z. H</au><au>YANG, G. Z</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>Effects of oxygen pressure on lattice parameter, orientation, surface morphology and deposition rate of (Ba0.02Sr0.98)TiO3 thin films grown on MgO substrate by pulsed laser deposition</atitle><jtitle>Thin solid films</jtitle><date>2005-08-01</date><risdate>2005</risdate><volume>485</volume><issue>1-2</issue><spage>82</spage><epage>89</epage><pages>82-89</pages><issn>0040-6090</issn><eissn>1879-2731</eissn><coden>THSFAP</coden><abstract>(Ba0*02Sr0*98)TiO3 thin films were grown on MgO substrate by pulsed laser deposition (PLD) techniques at various oxygen pressures from 40 to 10(--3)Pa. Effects of oxygen pressure on lattice parameter, orientation, surface morphology and deposition rate of the thin films were investigated. X--ray diffraction patterns indicate that, with decreasing oxygen pressure, crystal orientation of the thin films develops from (110) preferred orientation to random orientation, and finally to perfectly (00l) texture. Meantime, lattice parameter of the thin films increases with decreasing oxygen pressure. Especially, perfectly (00l)--oriented (Ba0*02Sr0*98)TiO3 thin film was obtained under oxygen pressure of 10(--3)Pa at substrate temperature of 850 deg C, in spite of the large lattice mismatch of about 8% between (Ba0*02Sr0*98)TiO3 and MgO. Atomic force microscopy images show that all the thin films have granular structure and the thin film grown at 10(--3)Pa has much more homogeneous grain size distribution compared to all the other thin films. Moreover, the films grown at oxygen pressures of 1 and 10(--1)Pa have more smooth surfaces, and the deposition rate of thin film increases with decreasing oxygen pressure. re.</abstract><cop>Lausanne</cop><pub>Elsevier Science</pub><doi>10.1016/j.tsf.2005.03.055</doi><tpages>8</tpages></addata></record> |
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subjects | Condensed matter: electronic structure, electrical, magnetic, and optical properties Condensed matter: structure, mechanical and thermal properties Cross-disciplinary physics: materials science rheology Electronic structure and electrical properties of surfaces, interfaces, thin films and low-dimensional structures Exact sciences and technology Materials science Methods of crystal growth physics of crystal growth Methods of deposition of films and coatings film growth and epitaxy Physics Surfaces and interfaces thin films and whiskers (structure and nonelectronic properties) Theory and models of crystal growth physics of crystal growth, crystal morphology and orientation Thin film structure and morphology |
title | Effects of oxygen pressure on lattice parameter, orientation, surface morphology and deposition rate of (Ba0.02Sr0.98)TiO3 thin films grown on MgO substrate by pulsed laser deposition |
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