Development of a highly sensitive porous Si-based hydrogen sensor using Pd nano-structures

A novel, resistance-based porous silicon sensor with Pd nano-structures as hydrogen sensing layer is presented. The sensor operates at room temperature. p-Type Si substrate is subjected to porous Si etching. The substrate is then coated with a thin layer of Pd and annealed at 900 °C. This results in...

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Veröffentlicht in:Sensors and actuators. B, Chemical Chemical, 2005-11, Vol.111 (Complete), p.125-129
Hauptverfasser: Luongo, Kevin, Sine, Altagrace, Bhansali, Shekhar
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Bhansali, Shekhar
description A novel, resistance-based porous silicon sensor with Pd nano-structures as hydrogen sensing layer is presented. The sensor operates at room temperature. p-Type Si substrate is subjected to porous Si etching. The substrate is then coated with a thin layer of Pd and annealed at 900 °C. This results in some Pd getting oxidized on porous Si and a thin PdO layer forms on the surface of the substrate. The sensor was tested in the range of 0–1.5% hydrogen. The sensor responded in real time. Unlike conventional thin film-based resistive hydrogen sensors this sensor showed an inverse relationship between increased hydrogen concentration versus resistance. The mechanism driving the changed output is discussed.
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subjects Actuators
Gas sensor
Impedance
Nanocomposites
Nanomaterials
Nanostructure
Palladium
PD nanoparticles
Porous Si
Sensors
Silicon substrates
Thin films
title Development of a highly sensitive porous Si-based hydrogen sensor using Pd nano-structures
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