An etch tunable antireflection coating for the controlled elimination of Fabry-Perot oscillations in the optical spectra of transverse modulator structures

A technique is described whereby an Si/sub x/N/sub y/ coating of a noncritical thickness in excess of 1/4 ( lambda /n/sub c/) is deposited and, using a process of repeated wet etching and measurement of the optical transmission spectrum, the thickness of the film is precisely adjusted to obtain an o...

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Veröffentlicht in:IEEE photonics technology letters 1989-08, Vol.1 (8), p.235-237
Hauptverfasser: Jelley, K.W., Englemann, R.W.H.
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Englemann, R.W.H.
description A technique is described whereby an Si/sub x/N/sub y/ coating of a noncritical thickness in excess of 1/4 ( lambda /n/sub c/) is deposited and, using a process of repeated wet etching and measurement of the optical transmission spectrum, the thickness of the film is precisely adjusted to obtain an optimized antireflection coating. Although this technique was developed for transverse modulators, it should prove beneficial for optically characterizing any structure susceptible to unwanted Fabry-Perot effects. Peak-to-peak oscillations as large as 20% of the maximum transmitted signal are reduced to zero over a 35-nm range. This effective range can be progressively shifted through the spectra so that spectra completely free of Fabry-Perot oscillations can be obtained.< >
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Although this technique was developed for transverse modulators, it should prove beneficial for optically characterizing any structure susceptible to unwanted Fabry-Perot effects. Peak-to-peak oscillations as large as 20% of the maximum transmitted signal are reduced to zero over a 35-nm range. 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Although this technique was developed for transverse modulators, it should prove beneficial for optically characterizing any structure susceptible to unwanted Fabry-Perot effects. Peak-to-peak oscillations as large as 20% of the maximum transmitted signal are reduced to zero over a 35-nm range. This effective range can be progressively shifted through the spectra so that spectra completely free of Fabry-Perot oscillations can be obtained.&lt; &gt;</description><subject>Absorption</subject><subject>Coatings</subject><subject>Etching</subject><subject>Fabry-Perot</subject><subject>Optical control</subject><subject>Optical films</subject><subject>Optical modulation</subject><subject>Optical refraction</subject><subject>Quantum well devices</subject><subject>Reflectivity</subject><issn>1041-1135</issn><issn>1941-0174</issn><fulltext>true</fulltext><rsrctype>article</rsrctype><creationdate>1989</creationdate><recordtype>article</recordtype><recordid>eNo9kE9LxDAQxYMouK6CV285iZeuSdM_6XFZXBUW9KDnkqZTN5ImNUmF_Sx-WbOteJo3zO_NMA-ha0pWlJLqvuArVpCcnaAFrTKaEFpmp1GTqCll-Tm68P6TEJrlLFugn7XBEOQeh9GIRgMWJigHnQYZlDVYWhGU-cCddTjsIfYmOKs1tBi06pURE2Y7vBWNOySv4GzA1kul9TTyWJnJaYegpNDYD3G1E0dLLMZ_g_OAe9uO0RCv-OBGGUYH_hKddUJ7uPqrS_S-fXjbPCW7l8fnzXqXSMqrkJSkTWnVNlSmXIiUQcY7BnnbQkcJBSYYl41Iu7Rsq5yWIhdEigJYyQEayTK2RLfz3sHZrxF8qHvlJcQHDNjR1ynPSs6qNIJ3Myid9T6mVA9O9cIdakrqY_p1wesp_YjezKgCgH9snv0CgmKEZA</recordid><startdate>19890801</startdate><enddate>19890801</enddate><creator>Jelley, K.W.</creator><creator>Englemann, R.W.H.</creator><general>IEEE</general><scope>AAYXX</scope><scope>CITATION</scope><scope>7SP</scope><scope>8FD</scope><scope>L7M</scope></search><sort><creationdate>19890801</creationdate><title>An etch tunable antireflection coating for the controlled elimination of Fabry-Perot oscillations in the optical spectra of transverse modulator structures</title><author>Jelley, K.W. ; Englemann, R.W.H.</author></sort><facets><frbrtype>5</frbrtype><frbrgroupid>cdi_FETCH-LOGICAL-c189t-70d219db1c28aa23e48f3e5ddef101e3a38cba2f27d9517a5a0ca6e378eebc343</frbrgroupid><rsrctype>articles</rsrctype><prefilter>articles</prefilter><language>eng</language><creationdate>1989</creationdate><topic>Absorption</topic><topic>Coatings</topic><topic>Etching</topic><topic>Fabry-Perot</topic><topic>Optical control</topic><topic>Optical films</topic><topic>Optical modulation</topic><topic>Optical refraction</topic><topic>Quantum well devices</topic><topic>Reflectivity</topic><toplevel>online_resources</toplevel><creatorcontrib>Jelley, K.W.</creatorcontrib><creatorcontrib>Englemann, R.W.H.</creatorcontrib><collection>CrossRef</collection><collection>Electronics &amp; Communications Abstracts</collection><collection>Technology Research Database</collection><collection>Advanced Technologies Database with Aerospace</collection><jtitle>IEEE photonics technology letters</jtitle></facets><delivery><delcategory>Remote Search Resource</delcategory><fulltext>fulltext_linktorsrc</fulltext></delivery><addata><au>Jelley, K.W.</au><au>Englemann, R.W.H.</au><format>journal</format><genre>article</genre><ristype>JOUR</ristype><atitle>An etch tunable antireflection coating for the controlled elimination of Fabry-Perot oscillations in the optical spectra of transverse modulator structures</atitle><jtitle>IEEE photonics technology letters</jtitle><stitle>LPT</stitle><date>1989-08-01</date><risdate>1989</risdate><volume>1</volume><issue>8</issue><spage>235</spage><epage>237</epage><pages>235-237</pages><issn>1041-1135</issn><eissn>1941-0174</eissn><coden>IPTLEL</coden><abstract>A technique is described whereby an Si/sub x/N/sub y/ coating of a noncritical thickness in excess of 1/4 ( lambda /n/sub c/) is deposited and, using a process of repeated wet etching and measurement of the optical transmission spectrum, the thickness of the film is precisely adjusted to obtain an optimized antireflection coating. 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identifier ISSN: 1041-1135
ispartof IEEE photonics technology letters, 1989-08, Vol.1 (8), p.235-237
issn 1041-1135
1941-0174
language eng
recordid cdi_proquest_miscellaneous_28478392
source IEEE Electronic Library (IEL)
subjects Absorption
Coatings
Etching
Fabry-Perot
Optical control
Optical films
Optical modulation
Optical refraction
Quantum well devices
Reflectivity
title An etch tunable antireflection coating for the controlled elimination of Fabry-Perot oscillations in the optical spectra of transverse modulator structures
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