Experimental determination of residual stress in silicon nitride diffusion bonds obtained by high-energy X-ray diffraction
High resolution X-ray scanning diffractometry has been used to study the residual strain in binary metal/ceramic (Ni/Si 3N 4) and ceramic/ceramic (Si 3N 4/Ni thin film/Si 3N 4) diffusion bonds. Bonds were fabricated by simultaneous high temperature heating and uniaxial pressing. The axial and radial...
Gespeichert in:
Veröffentlicht in: | Powder technology 2004-10, Vol.148 (1), p.60-63 |
---|---|
Hauptverfasser: | , , , , , , |
Format: | Artikel |
Sprache: | eng |
Schlagworte: | |
Online-Zugang: | Volltext |
Tags: |
Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!
|
Schreiben Sie den ersten Kommentar!