Cross‐sectional TEM investigation of nickel‐catalysed carbon nanotube films grown by plasma‐enhanced CVD

Summary Nickel‐catalysed multiwall carbon nanotubes synthesized by plasma‐enhanced chemical vapour deposition on a silicon substrate with acetylene and ammonia at 700 °C have been characterized by high‐resolution and analytical transmission electron microscopy. The nucleation of the carbon nanotubes occurs as a consequence of the carburization and dusting of supported preformed nickel‐ and silicon‐rich particles. This process yields disintegrated silicon‐containing nickel particles dispersed in dome‐shaped carbon islands adherent to the substrate. The particles act as catalysts for tube growth, resulting in aligned multiwall carbon nanotubes with a bamboo‐like structure anchored to the dome‐shaped carbon islands. The bottom part of the carbon islands contains bundles of graphene sheets orientated parallel to the substrate. The nanotubes are capped with fcc nickel particles containing dissolved silicon. Most of these particles have a conical shape orientated with a direction along the tube growth axis, and with {110} and {111} planes as exposed faces.