Structural characterization and thermal oxidation resistance of silicon oxycarbides produced by polysiloxane pyrolysis

Oxycarbides were produced by pyrolysis of polysiloxanes with different contents of methyl/phenyl groups at 1000 °C under nitrogen atmosphere. The structure of the three silicon oxycarbides was studied by elemental analysis, spectroscopy, and X-ray diffraction. The free carbon phase was concentrated...

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Veröffentlicht in:Materials chemistry and physics 2004-07, Vol.86 (1), p.88-98
Hauptverfasser: Kolar, F, Machovic, V, Svitilova, J, Borecka, L
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creator Kolar, F
Machovic, V
Svitilova, J
Borecka, L
description Oxycarbides were produced by pyrolysis of polysiloxanes with different contents of methyl/phenyl groups at 1000 °C under nitrogen atmosphere. The structure of the three silicon oxycarbides was studied by elemental analysis, spectroscopy, and X-ray diffraction. The free carbon phase was concentrated by treatment with hydrofluoric acid. The sp 2 graphene planes merged in sp 3 structures form the free carbon phase. Its content and location in the SiOC network and its structural pattern reflects the sp 2/sp 3 ratio of the source polysiloxanes.
doi_str_mv 10.1016/j.matchemphys.2004.02.011
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subjects Free carbon phase
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Silicon oxycarbides
Thermal oxidation resistance
title Structural characterization and thermal oxidation resistance of silicon oxycarbides produced by polysiloxane pyrolysis
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