Synthesis of ZrO2/Y2O3 by combined arc and magnetron sputtering technique

Preparation of yttria-stabilized zirconia (YSZ) films by combined reactive arc evaporation and magnetron sputtering was investigated in this work. At first, the dependencies of the film deposition rate on oxygen partial pressure, arc discharge current and magnetron discharge power were measured. Aft...

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Veröffentlicht in:	Surface & coatings technology 2004-03, Vol.180-181, p.53-58
Hauptverfasser:	Čyvien≐, J., Dudonis, J., Laurikaitis, M., Rakauskas, A., Milčius, D.
Format:	Artikel
Sprache:	eng
Online-Zugang:	Volltext
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