The effect of atomic hydrogen flow on electrical resistance of the transition metal films

On using of nuclear reaction analysis, X-ray analysis, electron microscopy, the mechanisms of structure and phase composition change of thin vanadium films at treatment in a flow consisting of molecular and atomic hydrogen (AH) have been studied. A comparative analysis on regularities of the film sa...

Ausführliche Beschreibung

Gespeichert in:
Bibliographische Detailangaben
Veröffentlicht in:Sensors and actuators. A. Physical. 2004-08, Vol.113 (3), p.293-300
Hauptverfasser: Kagadei, V., Nefyodtsev, E., Proskurovsky, D., Romanenko, Sv, Shevchenko, N., Grambole, D., Groetzschel, R., Herrmann, F., Ivanov, Yu
Format: Artikel
Sprache:eng
Schlagworte:
Online-Zugang:Volltext
Tags: Tag hinzufügen
Keine Tags, Fügen Sie den ersten Tag hinzu!