Relationship between Al2O3 film dissolution rate and the pitting potential of aluminum in NaCl solution

The dissolution rate of the Al2O3 film, Rdis (mol/cm2 s), and the pitting potential, Ep, of polycrystalline Al electrodes were measured in 50 mM H3BO3/0.3 mM Na2B4O7 * 10 H2O solutions (pH 6.7) containing between 0 and 200 mM NaCl. Rdis was determined by analysis of the transient current, using the...

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Veröffentlicht in:Journal of the Electrochemical Society 2004, Vol.151 (5), p.B265-B270
Hauptverfasser: BOXLEY, Chett J, WHITE, Henry S
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Sprache:eng
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